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收藏分享 收藏 Ultralow Iridium Dopant (<0.5 at. %) in LiNiO2 Oxide for Improved Structure StabilityUltralow Iridium Dopant (<0.5 at. %) in LiNiO2 Oxide for Improved Structure Stability
铱掺杂量极低（<0.5 at. %）的LiNiO2氧化物，用于提升结构稳定性
Wang, Jianwen; Gu, Long; Chen, Weixin; Su, Wencheng; Wang, Chao; Zhang, Yuying; Chen, Jiajun; Song, Haobin; Li, Yixiang; Li, Wenjing 分享 收藏 
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