Dip K. Nandi - Publications, H-index & Citations

Dip K. Nandi

Yeungnam University

23H指数

75论文数

1.5K被引数

收录论文 32

发表时间

New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition

SURFACES AND INTERFACES

IF6.3

2024-03-01

PREAI

Ansari, Mohd Zahid; Janicek, Petr; Namgung, Sook; Kim, Hyangil; Nandi, Dip K.; Cheon, Taehoon; Siddiqui, Masoom Raza; Imran, Muhammad; Jang, Yujin; Bae, Jong-Seong; Hong, Tae Eun; Park, Chaehyun; Son, Yeseul; Kim, Sang Bok; Kimj, Soo-Hyun

Atomic Layer Deposition-A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors 原子层沉积-用于高级超级电容器设计/工程电极的多功能工具箱

ADVANCED SCIENCE

IF14.1

2023-11-08

OAAI

Ansari, Mohd Zahid; Hussain, Iftikhar; Mohapatra, Debananda; Ansari, Sajid Ali; Rahighi, Reza; Nandi, Dip K.; Song, Wooseok; Kim, Soo-Hyun

Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor

APPLIED SURFACE SCIENCE

IF6.9

2023-05-01

PREAI

Ansari, Mohd Zahid; Janicek, Petr; Park, Ye Jin; NamGung, Sook; Cho, Bo Yeon; Nandi, Dip K.; Jang, Yujin; Bae, Jong-Seong; Hong, Tae Eun; Cheon, Taehoon; Song, Wooseok; An, Ki-Seok; Kim, Soo-Hyun

Cobalt-based metal oxide coated with ultrathin ALD-MoS2 as an electrode material for supercapacitors

CHEMICAL ENGINEERING JOURNAL

IF13.2

2022-05-01

OAAI

Pawar, Sachin A.; Patil, Dipali S.; Nandi, Dip K.; Islam, Muhammad Monirul; Sakurai, Takeaki; Kim, Soo-Hyun; Shin, Jae Cheol

Preparation of tungsten-based thin films using a F-free W precursor and tert-butyl hydrazine via 2-and 3-step atomic layer deposition process

APPLIED SURFACE SCIENCE

IF6.9

2022-03-01

PREAI

Lee, Jin-Hyeok; Hidayat, Romel; Ramesh, Rahul; Roh, Hyeonsu; Nandi, Dip K.; Lee, Won-Jun; Kim, Soo-Hyun

Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen

CHEMISTRY OF MATERIALS

IF7

2022-02-09

PREAI

Park, Na-Yeon; Kim, Minsu; Kim, Youn-Hye; Ramesh, Rahul; Nandi, Dip K.; Tsugawa, Tomohiro; Shigetomi, Toshiyuki; Suzuki, Kazuharu; Harada, Ryosuke; Kim, Miso; An, Ki-Seok; Shong, Bonggeun; Kim, Soo-Hyun

Low-temperature growth of crystalline Tin(II) monosulfide thin films by atomic layer deposition using a liquid divalent tin precursor

APPLIED SURFACE SCIENCE

IF6.9

2021-11-01

PREAI

Ansari, Mohd Zahid; Janicek, Petr; Nandi, Dip K.; Slang, Stanislav; Bouska, Marek; Oh, Hongjun; Shong, Bonggeun; Kim, Soo-Hyun

Atomic layer deposition of tungsten and tungsten-based compounds using WCl5 and various reactants selected by density functional theory

APPLIED SURFACE SCIENCE

IF6.9

2021-10-01

PREAI

Lee, Minyoung; Hidayat, Romel; Nandi, Dip K.; Kim, Tae Hyun; Kim, Yewon; Kim, Seongyoon; Lee, Won -Jun; Kim, Soo-Hyun

Atomic Layer Deposition of Ru for Replacing Cu-Interconnects

CHEMISTRY OF MATERIALS

IF7

2021-07-08

PREAI

Kotsugi, Yohei; Han, Seung-Min; Kim, Youn-Hye; Cheon, Taehoon; Nandi, Dip K.; Ramesh, Rahul; Yu, Neung-Kyung; Son, Kirak; Tsugawa, Tomohiro; Ohtake, Shigeyuki; Harada, Ryosuke; Park, Young-Bae; Shong, Bonggeun; Kim, Soo-Hyun

Atomic layer deposited Mo2N thin films using Mo(CO)6 and NH3 plasma as a Cu diffusion barrier

JOURNAL OF ALLOYS AND COMPOUNDS

IF6.3

2021-03-01

PREAI

Joo, Yong-Hwan; Nandi, Dip K.; Ramesh, Rahul; Jang, Yujin; Bae, Jong-Seong; Cheon, Taehoon; Kim, Soo-Hyun

Influence of post-annealing on structural, optical and electrical properties of tin nitride thin films prepared by atomic layer deposition

APPLIED SURFACE SCIENCE

IF6.9

2021-02-01

OAAI

Ansari, Mohd Zahid; Janicek, Petr; Nandi, Dip K.; Palka, Karel; Slang, Stanislav; Kim, Deok Hyun; Cheon, Taehoon; Kim, Soo-Hyun

Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-η) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction

ADVANCED MATERIALS INTERFACES

IF4.4

2020-12-15

PREAI

Ramesh, Rahul; Han, Seungmin; Nandi, Dip K.; Sawant, Sandesh Y.; Kim, Deok Hyun; Cheon, Taehoon; Cho, Moo Hwan; Harada, Ryosuke; Shigetomi, Toshiyuki; Suzuki, Kazuharu; Kim, Soo-Hyun

A review on atomic layer deposited buffer layers for Cu(In,Ga)Se2 (GIGS) thin film solar cells: Past, present, and future

SOLAR ENERGY

IF6.6

2020-10-01

PREAI

Sinha, Soumyadeep; Nandi, Dip K.; Pawar, Pravin S.; Kim, Soo-Hyun; Heo, Jaeyeong

Hydrogen Evolution Reaction by Atomic Layer-Deposited MoNx on Porous Carbon Substrates: The Effects of Porosity and Annealing on Catalyst Activity and Stability

CHEMSUSCHEM

IF6.6

2020-05-11

PREAI

Ramesh, Rahul; Sawant, Sandesh Y.; Nandi, Dip K.; Kim, Tae Hyun; Kim, Deok Hyun; Han, Seung-Min; Jang, Yujin; Ha, Myoung Gyu; Cho, Moo Hwan; Yoon, Taeho; Kim, Soo-Hyun

Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery Na离子电池中等离子体增强原子层沉积WS2阳极的厚度依赖性电化学响应

ELECTROCHIMICA ACTA

IF5.6

2019-11-01

PREAI

Nandi, Dip K.; Yeo, Seungmin; Ansari, Mohd Zahid; Sinha, Soumyadeep; Cheon, Taehoon; Kwon, Jiseok; Kim, Hyungjun; Heo, Jaeyeong; Song, Taeseup; Kim, Soo-Hyun

Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices 用于储能器件的高保形Tin氮化物薄膜的低温原子层沉积

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2019-10-21

PREAI

Ansari, Mohd Zahid; Nandi, Dip K.; Janicek, Petr; Ansari, Sajid Ali; Ramesh, Rahul; Cheon, Taehoon; Shong, Bonggeun; Kim, Soo-Hyun

Some Insights into Atomic Layer Deposition of MoNx Using Mo(CO)6 and NH3 and Its Diffusion Barrier Application

CHEMISTRY OF MATERIALS

IF7

2019-09-26

PREAI

Tae Hyun Kim; Nandi, Dip K.; Ramesh, Rahul; Han, Seung-Min; Shong, Bonggeun; Kim, Soo-Hyun

Revealing the Simultaneous Effects of Conductivity and Amorphous Nature of Atomic-Layer-Deposited Double-Anion-Based Zinc Oxysulfide as Superior Anodes in Na-Ion Batteries 揭示了原子层沉积的双阴离子基氧硫化锌作为钠离子电池中优异阳极的电导率和非晶态性质的同时影响

SMALL

IF12.1

2019-08-02

PREAI

Sinha, Soumyadeep; Didwal, Pravin N.; Nandi, Dip K.; Verma, Rakesh; Cho, Jae Yu; Kim, Soo-Hyun; Park, Chan-Jin; Heo, Jaeyeong

Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode

SCIENTIFIC REPORTS

IF3.9

2019-07-15

OAAI

Ansari, Mohd Zahid; Parveen, Nazish; Nandi, Dip K.; Ramesh, Rahul; Ansari, Sajid Ali; Cheon, Taehoon; Kim, Soo-Hyun

Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH3 and Selective Deposition on Defects of Graphene

ACS OMEGA

IF4.3

2019-06-25

OAAI

Kim, Minsu; Nabeya, Shunichi; Nandi, Dip K.; Suzuki, Kazuharu; Kim, Hyun-Mi; Cho, Seong-Yong; Kim, Ki-Bum; Kim, Soo-Hyun

研究方向