Byungwhan Kim - Publications, H-index & Citations

Byungwhan Kim

Sejong University

22H指数

213论文数

1.6K被引数

收录论文 30

发表时间

Use of Speckle Pattern for Monitoring Thermal Energy Behavior of Battery Cathode 使用散斑图案监测电池阴极的热能行为

JOURNAL OF THE OPTICAL SOCIETY OF KOREA

IF0

2016-06-25

PREAI

Kim, Byungwhan; Jang, Junyoung

Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing

EXPERT SYSTEMS WITH APPLICATIONS

IF7.5

2013-10-01

PREAI

Jeong, Young-Seon; Kim, Byungwhan; Ko, Young-Don

Design and VLSI implementation of a high-performance face detection engine

COMPUTERS & ELECTRICAL ENGINEERING

IF4.9

2012-09-01

PREAI

Han, Dongil; Choi, Jongho; Kim, Byungwhan; Cho, Jae Il

Use of neural network to in situ conditioning of semiconductor plasma processing equipment

APPLIED SOFT COMPUTING

IF6.6

2012-02-01

PREAI

Kim, Byungwhan; Kim, Daehyun

Room Temperature Deposition Process for Manufacturing Silicon Nitride Films Using Pulsed Plasma and Neural Network

MATERIALS AND MANUFACTURING PROCESSES

IF4.7

2011-10-01

PREAI

Kim, Daehyun; Kim, Byungwhan; Han, Dongil; Yoon, Neung Goo

Neural network modeling of inter-characteristics of silicon nitride film deposited by using a plasma-enhanced chemical vapor deposition

EXPERT SYSTEMS WITH APPLICATIONS

IF7.5

2011-09-01

PREAI

Lee, Su Jin; Kim, Byungwhan; Baik, Sung Wook

In-situ monitoring of plasma equipment using spectrophotometric colorimetry and neural network

CHEMOMETRICS AND INTELLIGENT LABORATORY SYSTEMS

IF3.8

2011-05-01

PREAI

Kim, Byungwhan; Kwon, Minji

Use of Neural Network and Genetic Algorithm to Model Scanning Electron Microscopy for Enhanced Image of Material Surfaces

MATERIALS AND MANUFACTURING PROCESSES

IF4.7

2011-04-11

PREAI

Kim, Byungwhan; Kim, Daehyun; Baik, Sung Wook; Lee, Sang Bum; Kim, Dong Hwan

Optimization of Wavelet-Filtered In-Situ Plasma Etch Data Using Neural Network and Genetic Algorithm

MATERIALS AND MANUFACTURING PROCESSES

IF4.7

2011-04-11

PREAI

Kim, Byungwhan; Kim, Daehyun; Han, Dongil; Lee, Nae-Il

In-Situ Leak Detection of Plasma Processing Chamber Using Neural Network and Optical Emission Spectroscopy

MATERIALS AND MANUFACTURING PROCESSES

IF4.7

2011-01-31

PREAI

Kim, Byungwhan; Kwon, Minji; Kim, Daehyun; Baik, Sung Wook; May, Gary S.; Jung, Jaehoon; Woo, Bongju

Optimization of Transmittance Characteristic of Indium Tin Oxide Film Using Neural Networks

METALS AND MATERIALS INTERNATIONAL

IF4

2010-10-26

PREAI

Kim, Byungwhan; Lee, Su Jin; Min, Chul Hong; Kim, Tae Seon

Room temperature, ion energy-controlled deposition of silicon nitride films in a SiH4-N2 plasma

METALS AND MATERIALS INTERNATIONAL

IF4

2010-08-26

PREAI

Kim, Byungwhan; Kwon, Minji; Seo, Yong Ho

Growth of silicon nitride film by controlling plasma ion energy and duty ratio at room temperature

METALS AND MATERIALS INTERNATIONAL

IF4

2010-08-26

PREAI

Kim, Byungwhan; Lee, Sujin

Functional Kernel-Based Modeling of Wavelet Compressed Optical Emission Spectral Data: Prediction of Plasma Etch Process

IEEE SENSORS JOURNAL

IF4.5

2010-03-01

PREAI

Ko, Young-Don; Jeong, Young-Seon; Jeong, Myong-Kee; Garcia-Diaz, Alberto; Kim, Byungwhan

Optimization of optical lens-controlled scanning electron microscopic resolution using generalized regression neural network and genetic algorithm

EXPERT SYSTEMS WITH APPLICATIONS

IF7.5

2010-01-01

PREAI

Kim, Byungwhan; Kwon, Sanghee; Kim, Dong Hwan

In-Situ Detection of Plasma Processing Equipment Using a V-Mask Control Chart

MATERIALS AND MANUFACTURING PROCESSES

IF4.7

2009-12-21

PREAI

Baik, Sung Wook; Kim, Woosuk; Kim, Byungwhan

Use of neural network to model X-ray photoelectron spectroscopy data for diagnosis of plasma etch equipment

EXPERT SYSTEMS WITH APPLICATIONS

IF7.5

2009-10-01

PREAI

Kim, Byungwhan; Kim, Jeong; Choi, Seongjin

Neural Network Model of Plasma Charging Damage on MOSFET Device

MATERIALS AND MANUFACTURING PROCESSES

IF4.7

2009-04-06

PREAI

Kim, Byungwhan; Lee, Hwa Jun; Kim, Donghwan

Statistical Characterization of Process-Induced Plasma Damage

MATERIALS AND MANUFACTURING PROCESSES

IF4.7

2009-04-06

PREAI

Kim, Byungwhan; Kwon, Sang Hee; Kwon, Kwang Ho; Baek, Kyu-Ha; Lee, Jin Ho; Kim, Dong Hwan; May, Gary S.

Use of adaptive network fuzzy inference system to predict plasma charging damage on electrical MOSFET properties

EXPERT SYSTEMS WITH APPLICATIONS

IF7.5

2009-04-01

PREAI

Kim, Byungwhan; Kwon, Hee Ju; Choi, Seongjin

研究方向