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J

J. Bruley

CEA

41H指数
221论文数
5.8K被引数
收录论文 21
发表时间
High-Efficiency Continuous Spin-Conduction through NiO/Cu Bilayer Structure高效率连续自旋传导通过NiO/Cu双层结构
err2025-03-04
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errOAAI
errSahoo, Biswajit; Safranski, Christopher; Hu, Guohan; Liang, Jim; Robbins, Michael; Hashemi, Pouya; Bruley, John; Sun, Jonathan Z.
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Effect of hot carrier stress on device junctions measured by electron holography and scanning capacitance microscopy
err2018-06-05
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PREAI
errWang, Y. Y.; Nxumalo, J.; Ioannou, D. P.; Katnani, A.; Brown, J.; Bandy, K.; Macdonald, M.; Krishnasamy, R.; Bruley, J.
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Template-assisted selective epitaxy of III-V nanoscale devices for co-planar heterogeneous integration with Si
err2015-06-08
err215
PREAI
errSchmid, H.; Borg, M.; Moselund, K.; Gignac, L.; Breslin, C. M.; Bruley, J.; Cutaia, D.; Riel, H.
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Strain-Driven Mound Formation of Substrate under Epitaxial Nanoparticles
err2014-12-22
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PREAI
errGupta, Tanya; Hannon, James B.; Tersoff, J.; Tromp, Rudolf M.; Ott, John A.; Bruley, John; Steingart, Daniel A.
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Vertical III-V Nanowire Device Integration on Si(100)
err2014-03-19
err148
PREAI
errBorg, Mattias; Schmid, Heinz; Moselund, Kirsten E.; Signorello, Giorgio; Gignac, Lynne; Bruley, John; Breslin, Chris; Das Kanungo, Pratyush; Werner, Peter; Riel, Heike
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Epitaxial c-axis oriented BaTiO3 thin films on SrTiO3-buffered Si(001) by atomic layer deposition
err2014-02-27
err72
errOAAI
errNgo, Thong Q.; Posadas, Agham B.; McDaniel, Martin D.; Hu, Chengqing; Bruley, John; Yu, Edward T.; Demkov, Alexander A.; Ekerdt, John G.
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Switching of ferroelectric polarization in epitaxial BaTiO3 films on silicon without a conducting bottom electrode (vol 8, pg 748, 2013)
err2013-11-07
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errOAAI
errDubourdieu, Catherine; Bruley, John; Arruda, Thomas M.; Posadas, Agham; Jordan-Sweet, Jean; Frank, Martin M.; Cartier, Eduard; Frank, David J.; Kalinin, Sergei V.; Demkov, Alexander A.; Narayanan, Vijay
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Switching of ferroelectric polarization in epitaxial BaTiO3 films on silicon without a conducting bottom electrode
err2013-09-29
err234
PREAI
errDubourdieu, Catherine; Bruley, John; Arruda, Thomas M.; Posadas, Agham; Jordan-Sweet, Jean; Frank, Martin M.; Cartier, Eduard; Frank, David J.; Kalinin, Sergei V.; Demkov, Alexander A.; Narayanan, Vijay
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Strain mapping of Si devices with stress memorization processing
err2013-07-30
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PREAI
errWang, Y. Y.; Bruley, J.; van Meer, H.; Li, J.; Domenicucci, A.; Murray, C. E.; Rouviere, J.
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Epitaxial Graphene Nanoribbon Array Fabrication Using BCP-Assisted Nanolithography使用BCP辅助纳米光刻技术制备外延石墨烯纳米带阵列
err2012-07-31
err79
PREAI
errLiu, Guanxiong; Wu, Yanqing; Lin, Yu-Ming; Farmer, Damon B.; Ott, John A.; Bruley, John; Grill, Alfred; Avouris, Phaedon; Pfeiffer, Dirk; Balandin, Alexander A.; Dimitrakopoulos, Christos
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Materials and electrical characterization of physical vapor deposited LaxLu1-xO3 thin films on 300 mm silicon
err2011-03-23
err8
PREAI
errEdge, L. F.; Vo, T.; Paruchuri, V. K.; Iijima, R.; Bruley, J.; Jordan-Sweet, J.; Linder, B. P.; Kellock, A. J.; Tsunoda, T.; Shinde, S. R.
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Epitaxial SrO interfacial layers for HfO2-Si gate stack scaling
err2011-02-02
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PREAI
errMarchiori, C.; Frank, M. M.; Bruley, J.; Narayanan, V.; Fompeyrine, J.
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Physical origins of mobility degradation in extremely scaled SiO2/HfO2 gate stacks with La and Al induced dipoles
err2010-04-01
err73
PREAI
errAndo, Takashi; Copel, Matt; Bruley, John; Frank, Martin M.; Watanabe, Heiji; Narayanan, Vijay
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Direct evidence for abrupt postcrystallization germanium precipitation in thin phase-change films of Sb-15 at.% Ge
err2008-08-22
err48
errOAAI
errCabral, C., Jr.; Krusin-Elbaum, L.; Bruley, J.; Raoux, S.; Deline, V.; Madan, A.; Pinto, T.
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Evidence for segregation of Te in Ge2Sb2Te5 films:: Effect on the phase-change stress
err2007-04-04
err115
PREAI
errKrusin-Elbaum, L.; Cabral, C., Jr.; Chen, K. N.; Copel, M.; Abraham, D. W.; Reuter, K. B.; Rossnagel, S. M.; Bruley, J.; Deline, V. R.
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