Patrick Naulleau - Publications, H-index & Citations

Patrick Naulleau

united states department of energy (doe)

31H指数

550论文数

4.2K被引数

收录论文 16

发表时间

Mechanistic Advantages of Organotin Molecular EUV Photoresists 有机锡分子EUV光致抗蚀剂的机理优势

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2022-01-25

OAAI

Ma, Jonathan H.; Needham, Craig; Wang, Han; Neureuther, Andrew; Prendergast, David; Naulleau, Patrick

Additive Lithography-Organic Monolayer Patterning Coupled with an Area-Selective Deposition

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2021-01-20

OAAI

Wojtecki, Rudy; Ma, Jonathan; Cordova, Isvar; Arellano, Noel; Lionti, Krystelle; Magbitang, Teddie; Pattison, Thomas G.; Zhao, Xiao; Delenia, Eugene; Lanzillo, Nicholas; Hess, Alexander E.; Nathel, Noah Fine; Bui, Holt; Rettner, Charles; Wallraff, Gregory; Naulleau, Patrick

Single-shot large field of view Fourier transform holography with a picosecond plasma-based soft X-ray laser

OPTICS EXPRESS

IF3.3

2020-11-11

OAAI

Wang, Shoujun; Rockwood, Alex; Wang, Yong; Chao, Wei-Lun; Naulleau, Patrick; Song, Huanyu; Menoni, Carmen S.; Marconi, Mario; Rocca, Jorge J.

Extreme ultraviolet microscope characterization using photomask surface roughness

SCIENTIFIC REPORTS

IF3.9

2020-07-15

OAAI

Gunjala, Gautam; Wojdyla, Antoine; Sherwin, Stuart; Shanker, Aamod; Benk, Markus P.; Goldberg, Kenneth A.; Naulleau, Patrick P.; Waller, Laura

Estimation of Line Cross Sections Using Critical-Dimension Grazing-Incidence Small-Angle X-Ray Scattering

PHYSICAL REVIEW APPLIED

IF4.4

2019-10-11

OAAI

Freychet, Guillaume; Kumar, Dinesh; Pandolfi, Ron J.; Naulleau, Patrick; Cordova, Isvar; Ercius, Peter; Song, Chengyu; Strzalka, Joseph; Hexemet, Alexander

Fundamental understanding of chemical processes in extreme ultraviolet resist materials

JOURNAL OF CHEMICAL PHYSICS

IF3.1

2018-10-19

OAAI

Kostko, Oleg; Xu, Bo; Ahmed, Musahid; Slaughter, Daniel S.; Ogletree, D. Frank; Closser, Kristina D.; Prendergast, David G.; Naulleau, Patrick; Olynick, Deirdre L.; Ashby, Paul D.; Liu, Yi; Hinsberg, William D.; Wallraff, Gregory M.

The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materials

JOURNAL OF CHEMICAL PHYSICS

IF3.1

2017-04-27

OAAI

Closser, Kristina D.; Ogletree, D. Frank; Naulleau, Patrick; Prendergast, David

X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching

APPLIED PHYSICS LETTERS

IF3.6

2016-07-29

OAAI

Voronov, Dmitriy L.; Lum, Paul; Naulleau, Patrick; Gullikson, Eric M.; Fedorov, Alexei V.; Padmore, Howard A.

Quantitative phase retrieval with arbitrary pupil and illumination

OPTICS EXPRESS

IF3.3

2015-10-02

OAAI

Claus, Rene A.; Naulleau, Patrick P.; Neureuther, Andrew R.; Waller, Laura

Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning 用于极紫外光刻的抗蚀剂材料: 迈向低成本的个位数纳米图案化

ADVANCED MATERIALS

IF26.8

2015-06-16

PREAI

Ashby, Paul D.; Olynick, Deirdre L.; Ogletree, D. Frank; Naulleau, Patrick P.

Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source

OPTICS EXPRESS

IF3.3

2014-08-12

OAAI

Naulleau, Patrick P.; Anderson, Christopher N.; Anderson, Erik H.; Andreson, Nord; Chao, Weilun; Choi, Changhoon; Goldberg, Kenneth A.; Gullikson, Eric M.; Kim, Seong-Sue; Lee, Donggun; Miyakawa, Ryan; Park, Jongju; Rekawa, Seno; Salmassi, Farhad

Coded aperture detector: an image sensor with sub 20-nm pixel resolution

OPTICS EXPRESS

IF3.3

2014-08-08

OAAI

Miyakawa, Ryan; Mayer, Rafael; Wojdyla, Antoine; Vannier, Nicolas; Lesser, Ian; Aron-Dine, Shifrah; Naulleau, Patrick

Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination

OPTICS LETTERS

IF3.3

2009-01-26

PREAI

Brizuela, F.; Wang, Y.; Brewer, C. A.; Pedaci, F.; Chao, W.; Anderson, E. H.; Liu, Y.; Goldberg, K. A.; Naulleau, P.; Wachulak, P.; Marconi, M. C.; Attwood, D. T.; Rocca, J. J.; Menoni, C. S.

Absolute sensitivity calibration of extreme ultraviolet photoresists

OPTICS EXPRESS

IF3.3

2008-07-18

OAAI

Naulleau, Patrick P.; Gullikson, Eric M.; Aquila, Andy; George, Simi; Niakoula, Dimitra

Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer

OPTICS LETTERS

IF3.3

2002-06-15

PREAI

Chang, C; Anderson, E; Naulleau, P; Gullikson, E; Goldberg, K; Attwood, D