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P
Pei‐I Wang
rensselaer polytechnic institute
16
H指数
61
论文数
1.2K
被引数
0
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16
发表时间
发表时间
IF
被引数
Mechanism for the Formation of Isolated Poly(p-xylylene) Fibrous Structures under Shadowing Growth
LANGMUIR
IF
3.9
2011-03-29
11
PRE
AI
He, Ming; Wang, Pei-I; Lu, Toh-Ming
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Biaxially Textured Al Film Growth on CaF2 Nanostructures toward a Method of Preparing Single-Crystalline Si Film on Glass Substrates
ACS NANO
IF
16
2010-09-14
11
PRE
AI
Li, Huafang; Snow, Patrick; He, Ming; Wang, Pei-I; Wang, Gwo-Ching; Lu, Toh-Ming
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Kinetics of Ta ions penetration into porous low-k dielectrics under bias-temperature stress
APPLIED PHYSICS LETTERS
IF
3.6
2010-06-01
16
PRE
AI
He, Ming; Ou, Ya; Wang, Pei-I; Lu, Toh-Ming
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Nanostructured copper interfaces for enhanced boiling
SMALL
IF
12.1
2008-07-31
474
PRE
AI
Li, Chen; Wang, Zuankai; Wang, Pei-I; Peles, Yoav; Koratkar, Nikhil; Peterson, G. P.
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Conduction Mechanisms of Ta/Porous SiCOH Films under Electrical Bias
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2008-01-01
28
PRE
AI
Ou, Ya; Wang, Pei-I.; He, Ming; Lu, T. -M.; Leung, Pak; Spooner, Terry A.
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Thermal stability study of pore sealing using parylene N
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2008-01-01
9
PRE
AI
Ou, Ya; Wang, Pei-I; Vanamurthy, Lakshmanan H.; Bakhru, Hassaram; Lu, T. -M.; Spencer, Greg
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Instability of metal barrier with porous methyl silsesquioxane films
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2008-01-01
17
PRE
AI
Wang, Pei-I; Juneja, Jasbir S.; Ou, Y.; Lu, T. -M.; Spencer, Greg S.
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Enhancement of cu(hfac)2 chemisorption on the parylene surface by N2 plasma surface modification
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2007-01-01
4
PRE
AI
Pimanpang, S.; Wang, Pei-I; Ye, Dexian; Juneja, Jasbir S.; Wang, G.-C.; Lu, T.-M.
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Self-assembled monolayer growth on chemically modified polymer surfaces
APPLIED SURFACE SCIENCE
IF
6.9
2006-03-01
10
PRE
AI
Pimanpang, S; Wang, PI; Wang, GC; Lu, TM
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Stability of Cu on epoxy siloxane polymer under bias temperature stress
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2006-01-01
1
PRE
AI
Wang, PI; Juneja, JS; Murarka, SP; Lu, TM; Jezewski, C; Ghoshal, R; Ghoshal, R; Bakhru, H
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Bias-temperature stability of Ti-Si-N-O films
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2006-01-01
6
PRE
AI
Ee, YC; Juneja, JS; Wang, PI; Lu, TM; Bakhru, H; Chan, L; Law, SB; Yong, C; Chen, Z; Xu, S
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A novel polycarbosilane-based low-k dielectric material
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2006-01-01
31
PRE
AI
Wang, PI; Wu, ZZ; Lu, TM; Interrante, LV
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Inductively coupled hydrogen plasma-assisted Cu ALD on metallic and dielectric surfaces
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2005-01-01
47
PRE
AI
Jezewski, C; Lanford, WA; Wiegand, CJ; Singh, JP; Wang, PI; Senkevich, JJ; Lu, TM
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Bias-temperature stability of ultrathin parylene-capped dielectrics: influence of surface oxygen on copper ion diffusion
APPLIED PHYSICS LETTERS
IF
3.6
2004-04-05
18
OA
AI
Senkevich, JJ; Wang, PI; Wiegand, CJ; Lu, TM
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Evolution of the Cu-Al alloy/SiO2 interfaces during bias temperature stressing
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2001-01-01
10
PRE
AI
Wang, PI; Murarka, SP; Yang, GR; Lu, TM
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Surface segregation of Al of the bilayers of pure Cu and Cu-Al alloy films
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2001-01-01
14
PRE
AI
Wang, PI; Murarka, SP; Kaminski, DA; Bedell, S; Lanford, WA
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研究方向
暂时未获取到该数据
合作学者
合作期刊
陈钟
(Zhong Chen)
H 指数: 104 · 论文数: 1.2K
Z
Zuankai Wang
H 指数: 96 · 论文数: 516
N
Nikhil Koratkar
H 指数: 92 · 论文数: 342
G
G. P. Peterson
H 指数: 56 · 论文数: 405
Y
Yoav Peles
H 指数: 54 · 论文数: 250
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