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T
Tamotsu Hashizume
Hokkaido University
42
H指数
426
论文数
7.3K
被引数
0
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30
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Impact of oxide/barrier charge on threshold voltage instabilities in AlGaN/GaN metal-oxide-semiconductor heterostructures (vol 91, pg 356, 2019)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF
4.6
2019-04-01
0
PRE
AI
Tapajna, M.; Drobny, J.; Gucmann, F.; Husekova, K.; Gregusova, D.; Hashizume, T.; Kuzmik, J.
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Impact of oxide/barrier charge on threshold voltage instabilities in AlGaN/GaN metal-oxide-semiconductor heterostructures
AlGaN/GaN金属-氧化物-半导体异质结构中氧化物/势垒电荷对阈值电压不稳定性的影响
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF
4.6
2019-03-01
6
PRE
AI
Tapajna, M.; Drobny, J.; Gucmann, F.; Husekova, K.; Gregusova, D.; Hashizume, T.; Kuzmik, J.
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State of the art on gate insulation and surface passivation for GaN-based power HEMTs
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF
4.6
2018-05-01
116
OA
AI
Hashizume, Tamotsu; Nishiguchi, Kenya; Kaneki, Shota; Kuzmik, Jan; Yatabe, Zenji
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High Thermoelectric Power Factor of High-Mobility 2D Electron Gas
ADVANCED SCIENCE
IF
14.1
2017-11-24
55
OA
AI
Ohta, Hiromichi; Kim, Sung Wng; Kaneki, Shota; Yamamoto, Atsushi; Hashizume, Tamotsu
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Highly-stable and low-state-density Al2O3/GaN interfaces using epitaxial n-GaN layers grown on free-standing GaN substrates
APPLIED PHYSICS LETTERS
IF
3.6
2016-10-18
92
PRE
AI
Kaneki, Shota; Ohira, Joji; Toiya, Shota; Yatabe, Zenji; Asubar, Joel T.; Hashizume, Tamotsu
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Insulated gate and surface passivation structures for GaN-based power transistors
JOURNAL OF PHYSICS D-APPLIED PHYSICS
IF
3.2
2016-09-07
186
OA
AI
Yatabe, Zenji; Asubar, Joel T.; Hashizume, Tamotsu
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Experimental Validation of Normally-On GaN HEMT and Its Gate Drive Circuit
常通型GaN HEMT及其栅极驱动电路的实验验证
IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS
IF
4.5
2015-05-01
40
PRE
AI
Ishibashi, Takaharu; Okamoto, Masayuki; Hiraki, Eiji; Tanaka, Toshihiko; Hashizume, Tamotsu; Kikuta, Daigo; Kachi, Tetsu
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Reduced thermal resistance in AlGaN/GaN multi-mesa-channel high electron mobility transistors
APPLIED PHYSICS LETTERS
IF
3.6
2014-08-07
32
OA
AI
Asubar, Joel T.; Yatabe, Zenji; Hashizume, Tamotsu
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Direct measurement of donor-like interface state density and energy distribution at insulator/AlGaN interface in metal/Al2O3/AlGaN/GaN by photocapacitance method
APPLIED PHYSICS LETTERS
IF
3.6
2013-07-08
17
OA
AI
Matys, M.; Adamowicz, B.; Hori, Y.; Hashizume, T.
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Determination of the deep donor-like interface state density distribution in metal/Al2O3/n-GaN structures from the photocapacitance-light intensity measurement
APPLIED PHYSICS LETTERS
IF
3.6
2012-12-06
25
OA
AI
Matys, M.; Adamowicz, B.; Hashizume, T.
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Studies on atomic layer deposition Al2O3/In0.53Ga0.47As interface formation mechanism based on air-gap capacitance-voltage method
APPLIED PHYSICS LETTERS
IF
3.6
2012-09-18
6
OA
AI
Yoshida, Toshiyuki; Hashizume, Tamotsu
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Al0.44Ga0.56N spacer layer to prevent electron accumulation inside barriers in lattice-matched InAlN/AlGaN/AlN/GaN heterostructures
APPLIED PHYSICS LETTERS
IF
3.6
2011-04-07
5
PRE
AI
Akazawa, M.; Gao, B.; Hashizume, T.; Hiroki, M.; Yamahata, S.; Shigekawa, N.
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Small valence-band offset of In0.17Al0.83N/GaN heterostructure grown by metal-organic vapor phase epitaxy
APPLIED PHYSICS LETTERS
IF
3.6
2010-03-31
56
OA
AI
Akazawa, M.; Matsuyama, T.; Hashizume, T.; Hiroki, M.; Yamahata, S.; Shigekawa, N.
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Electrochemical Functionalization of InP Porous Nanostructures with a GOD Membrane for Amperometric Glucose Sensors
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2010-01-01
7
OA
AI
Sato, Taketomo; Mizohata, Akinori; Hashizume, Tamotsu
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Near-midgap deep levels in Al0.26Ga0.74N grown by metal-organic chemical vapor deposition
APPLIED PHYSICS LETTERS
IF
3.6
2009-04-16
15
OA
AI
Sugawara, Katsuya; Kotani, Junji; Hashizume, Tamotsu
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Mechanism of surface conduction in the vicinity of Schottky gates on AlGaN/GaN heterostructures
APPLIED PHYSICS LETTERS
IF
3.6
2007-08-28
100
PRE
AI
Kotani, Junji; Tajima, Masafumi; Kasai, Seiya; Hashizume, Tamotsu
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Fabrication and characterization of a GaAs-based three-terminal nanowire junction device controlled by double Schottky wrap gates
APPLIED PHYSICS LETTERS
IF
3.6
2007-03-06
17
OA
AI
Nakamura, Tatsuya; Kasai, Seiya; Shiratori, Yuta; Hashizume, Tamotsu
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Dynamics and control of recombination process at semiconductor surfaces, interfaces and nano-structures
SOLAR ENERGY
IF
6.6
2006-06-01
17
PRE
AI
Hasegawa, Hideki; Sato, Taketomo; Kasai, Seiya; Adamowicz, Boguslawa; Hashizume, Tamotsu
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Pt Schottky diode gas sensors formed on GaN and AlGaN/GaN heterostructure
APPLIED SURFACE SCIENCE
IF
6.9
2005-05-01
78
PRE
AI
Matsuo, K; Negoro, N; Kotani, J; Hashizume, T; Hasegawa, H
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Surface-related reduction of photoluminescence in GaAs quantum wires and its recovery by new passivation
GaAs量子线中与表面相关的光致发光减少及其通过新钝化的恢复
APPLIED SURFACE SCIENCE
IF
6.9
2005-05-01
1
OA
AI
Shiozaki, N; Anantathanasarn, S; Sato, T; Hashizume, T; Hasegawa, H
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研究方向
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合作学者
合作期刊
H
Hiromichi Ohta
H 指数: 72 · 论文数: 815
H
Hideki Hasegawa
H 指数: 68 · 论文数: 595
H
Hiroshi Hasegawa
H 指数: 61 · 论文数: 948
T
Takashi Fukui
H 指数: 54 · 论文数: 489
S
Sung Wng Kim
H 指数: 53 · 论文数: 262
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