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收藏Microwave plasma modification-assisted shear-thickening polishing of single-crystal silicon carbide单晶碳化硅的微波等离子体改性辅助剪切增稠抛光
Shen, Mengmeng; Wei, Min; Wu, Lingwei; Hong, Binbin; Ye, Jiahao; Chen, Hongyu; Yuan, Julong; Lyu, Binghai; Wang, Chuansheng; Deng, Hui; Hang, Wei
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收藏High-efficiency free-damage electrochemical shear-thickening polishing of single-crystal silicon carbide单晶碳化硅的高效无损伤电化学剪切增稠抛光
Shen, Mengmeng; Wu, Lingwei; Wei, Min; Chen, Hongyu; Yuan, Julong; Lyu, Binghai; Deng, Hui; To, Suet; Beri, Tufa Habtamu; Hang, Wei
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收藏Study on the affecting factors of material removal mechanism and damage behavior of shear rheological polishing of single crystal silicon carbide ( vol 112 ,5158 , 2024)
Chen, Hongyu; Wu, Zhengchao; Hong, Binbin; Hang, Wei; Zhang, Peng; Cao, Xingzhong; Xu, Qiu; Chen, Pengqi; Chen, Heng; Yuan, Julong; Lyu, Binghai; Lin, Hua-Tay
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收藏Study on the affecting factors of material removal mechanism and damage behavior of shear rheological polishing of single crystal silicon carbide
Chen, Hongyu; Wu, Zhengchao; Hong, Binbin; Hang, Wei; Zhang, Peng; Cao, Xingzhong; Xu, Qiu; Chen, Pengqi; Chen, Heng; Yuan, Julong; Lyu, Binghai; Lin, Hua-Tay
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