未登录
分享
收藏Chemical vapor deposition of HfO2 thin films using the novel single precursor hafnium 3-methyl-3-pentoxide, Hf(mp)4
Yang, TS; An, KS; Lee, EJ; Cho, W; Jang, HS; Park, SK; Lee, YK; Chung, TM; Kim, CG; Kim, S; Hwang, JH; Lee, C; Lee, NS; Kim, Y
分享
收藏
分享
收藏
分享
收藏
分享
收藏