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G
G. Bose
indian institute of technology system (iit system)
12
H指数
68
论文数
503
被引数
0
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7
发表时间
发表时间
IF
被引数
Structural and morphological study of thermally oxidized titanium thin films for the detection of chlorpyrifos
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF
4.6
2020-01-01
2
PRE
AI
Ghosh, S. P.; Pattnaik, S.; Pradhan, D.; Das, K. C.; Tripathy, N.; Bose, G.; Kar, J. P.
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Enhanced organophosphate sensing response of copper incorporated ZnO nanowires
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF
4.6
2019-12-01
5
PRE
AI
Ghosh, S. P.; Pradhan, D.; Pattnaik, S.; Tripathy, N.; Das, K. C.; Bose, G.; Kar, J. P.
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Structural and optical properties of RF magnetron sputtered aluminum nitride films without external substrate heating
APPLIED SURFACE SCIENCE
IF
6.9
2011-09-01
35
PRE
AI
Singh, Atul Vir; Chandra, Sudhir; Srivastava, A. K.; Chakroborty, B. R.; Sehgal, G.; Dalai, M. K.; Bose, G.
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A study on the interface and bulk charge density of AIN films with sputtering pressure
VACUUM
IF
3.9
2006-11-01
26
PRE
AI
Kar, J. P.; Bose, G.; Tuli, S.
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Influence of nitrogen concentration on grain growth, structural and electrical properties of sputtered aluminum nitride films
SCRIPTA MATERIALIA
IF
5.6
2006-05-01
28
PRE
AI
Kar, JP; Bose, G; Tuli, S
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Effect of annealing on DC sputtered aluminum nitride films
SURFACE & COATINGS TECHNOLOGY
IF
6.1
2005-08-01
20
PRE
AI
Kar, JP; Bose, G; Tuli, S
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Influence of rapid thermal annealing on morphological and electrical properties of RF sputtered AlN films
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF
4.6
2005-01-01
34
PRE
AI
Kar, J. P.; Bose, G.; Tuli, S.
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研究方向
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合作学者
合作期刊
A
Avanish Kumar Srivastava
H 指数: 58 · 论文数: 411
J
Jyoti Prakash Kar
H 指数: 24 · 论文数: 152
S
Sandip Ghosh
H 指数: 24 · 论文数: 203
S
Shreshth Tuli
H 指数: 23 · 论文数: 120
S
Sudhir Chandra
H 指数: 20 · 论文数: 156
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