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J

J. Aubreton

centre national de la recherche scientifique (cnrs)

25H指数
124论文数
1.8K被引数
收录论文 18
发表时间
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Expanding microwave plasma process for thin molybdenum films nitriding: Nitrogen diffusion and structure investigations
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2011-07-01
err9
PREAI
errJauberteau, Isabelle; Merle-Mejean, Therese; Touimi, Said; Weber, Sylvain; Bessaudou, Annie; Passelergue, Armand; Jauberteau, Jean Louis; Aubreton, Jacques
err分享
err收藏
Plasma chemistry and diagnostic in an Ar-N2-H2 microwave expanding plasma used for nitriding treatments
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2010-05-06
err7
errOAAI
errTouimi, S.; Jauberteau, J. L.; Jauberteau, I.; Aubreton, J.
err分享
err收藏
Investigations on a nitriding process of molybdenum thin films exposed to (Ar-N2-H2) expanding microwave plasma
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2009-01-01
err19
PREAI
errJauberteau, I.; Jauberteau, J. L.; Goudeau, P.; Soulestin, B.; Marteau, M.; Cahoreau, M.; Aubreton, J.
err分享
err收藏
Treatment of non-equilibrium phenomena in thermal plasma flows
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2008-08-29
err138
PREAI
errRat, V.; Murphy, A. B.; Aubreton, J.; Elchinger, M. F.; Fauchais, P.
err分享
err收藏
High temperature transport coefficients in e/C/H/N/O mixtures
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2006-03-03
err50
PREAI
errSourd, B; Aubreton, J; Elchinger, MF; Labrot, M; Michon, U
err分享
err收藏
Plasma concentrations out of equilibrium:: N2 (Kinetic method and mass action law), Ar-CCl4 and Ar-H2-CCl4 (mass action law)
errHEAT AND MASS TRANSFER UNDER PLASMA CONDITIONS
IF0
err2006-02-06
err8
PREAI
errAndre, P; Aubreton, J; Elchinger, MF; Fauchais, P; Lefort, A
err分享
err收藏
Surface reactivity of molybdenum thin films exposed to (Ar-N2-H2) expanding microwave plasma at low temperature:: influence of the addition of H2 gas in the plasma
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2005-09-16
err4
PREAI
errJauberteau, I; Jauberteau, JL; Cahoreau, M; Aubreton, J
err分享
err收藏
Thermodynamic and transport properties of a ternary Ar-H2-He mixture out of equilibrium up to 30000 K at atmospheric pressure
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2004-07-29
err34
PREAI
errAubreton, J; Elchinger, MF; Fauchais, P; Rat, V; André, P
err分享
err收藏
Electrostatic probe measurements in an expanding microwave discharge sustained in an Ar-N2-H2 gas mixture:: Investigation on plasma parameters
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2004-03-31
err10
PREAI
errJauberteau, JL; Jauberteau, I; Aubreton, J
err分享
err收藏
Two-temperature transport coefficients in argon-helium thermal plasmas
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2003-12-10
err53
PREAI
errAubreton, J; Elchinger, MF; Rat, V; Fauchais, P
err分享
err收藏
Theoretical study of column of discharge with liquid non-metallic (tap water) electrodes in air at atmospheric pressure
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2002-07-16
err40
PREAI
errAndre, P; Aubreton, J; Barinov, Y; Elchinger, MF; Fauchais, P; Faure, G; Kaplan, V; Lefort, A; Rat, V; Shkol'nik, S
err分享
err收藏
Transport coefficients including diffusion in a two-temperature argon plasma
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2002-05-02
err92
PREAI
errRat, V; André, P; Aubreton, J; Elchinger, MF; Fauchais, P; Vacher, D
err分享
err收藏
NH3 and NHx3 radicals synthesis downstream a microwave discharge sustained in an Ar-N2-H2 gas mixture. : Study of surface reactive processes and determination of rate constants
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2002-03-20
err38
PREAI
errJauberteau, JL; Jauberteau, I; Aubreton, J
err分享
err收藏
A modified pseudo-equilibrium model competing with kinetic models to determine the composition of a two-temperature SF6 atmosphere plasma修改后的伪平衡模型与动力学模型竞争，以确定两温SF6大气等离子体的组成
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2001-07-04
err33
PREAI
errRat, V; André, P; Aubreton, J; Elchinger, MF; Fauchais, P; Lefort, A
err分享
err收藏
Measurement of rate constants between atomic nitrogen and silane in a nitrogen discharge afterglow
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2000-05-31
err3
PREAI
errAubreton, J; Conte, D; Jauberteau, JL; Jauberteau, I
err分享
err收藏
Plasma nitriding of thin molybdenum layers at low temperature
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err1999-09-01
err11
PREAI
errJauberteau, I; Jauberteau, JL; Séméria, MN; Larré, A; Piaguet, J; Aubreton, J
err分享
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A spatially resolved plasma diagnostic in an expanding microwave discharge containing an Ar-CH4 gas mixture:: uniformity and stability of the discharge
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err1999-01-01
err10
PREAI
errJauberteau, JL; Cinelli, MJ; Jauberteau, I; Aubreton, J
err分享
err收藏
Initial stages in the growth of carbon films produced in an Ar-CH4-H-2 microwave discharge: Composition and surface layers morphology
errAPPLIED PHYSICS LETTERS
IF3.6
err1996-03-18
err7
PREAI
errThomas, L; Jauberteau, I; Jauberteau, JL; Cinelli, MJ; Aubreton, J; Catherinot, A
err分享
err收藏

研究方向

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合作学者
合作期刊
A
Anthony B. Murphy
H 指数: 65 · 论文数: 467
P
P. Fauchais
H 指数: 58 · 论文数: 712
P
P. Goudeau
H 指数: 38 · 论文数: 298
S
S.M. Shkol'nik
H 指数: 26 · 论文数: 137
T
Thérèse Merle‐Méjean
H 指数: 23 · 论文数: 95
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