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收藏Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography
Cong, Xue; Zhang, Siliang; Gao, Jiaxing; Cui, Xuewen; Wu, Yurui; Guo, Xudong; Hu, Rui; Wang, Shuangqing; Chen, Jinping; Li, Yi; Yang, Guoqiang
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收藏Optimization strategy for epoxy cross-linked molecular glass photoresist in EUV lithographyEUV光刻中环氧交联分子玻璃光刻胶的优化策略
Gao, Jiaxing; Zhang, Siliang; Cui, Xuewen; Cong, Xue; Guo, Xudong; Hu, Rui; Wang, Shuangqing; Chen, Jinping; Li, Yi; Tian, Peng; Vockenhuber, Michaela; Kazazis, Dimitrios; Ekinci, Yasin; Yang, Guoqiang
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收藏Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography
Zhang, Siliang; Chen, Long; Gao, Jiaxing; Cui, Xuewen; Cong, Xue; Guo, Xudong; Hu, Rui; Wang, Shuangqing; Chen, Jinping; Li, Yi; Yang, Guoqiang
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收藏Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist分子玻璃负性光刻胶电子束光刻的有效优化策略
Gao, Jiaxing; Zhang, Siliang; Cui, Xuewen; Cong, Xue; Guo, Xudong; Hu, Rui; Wang, Shuangqing; Chen, Jinping; Li, Yi; Yang, Guoqiang
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