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Siliang Zhang

University of Chinese Academy of Sciences

11H指数
196论文数
599被引数
收录论文 14
发表时间
Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance生物相容性卟啉衍生物电子束与极紫外光刻胶:高分辨率和高刻蚀抗性
err2025-05-27
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errOAAI
errYurui Wu; Siliang Zhang; Xuewen Cui; Xue Cong; Shuang Liu; Lei Wang; Xudong Guo; Rui Hu; Shuangqing Wang; Jinping Chen; Yi Li; Jun Zhao; Shumin Yang
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Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography
err2024-08-27
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errCong, Xue; Zhang, Siliang; Gao, Jiaxing; Cui, Xuewen; Wu, Yurui; Guo, Xudong; Hu, Rui; Wang, Shuangqing; Chen, Jinping; Li, Yi; Yang, Guoqiang
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Optimization strategy for epoxy cross-linked molecular glass photoresist in EUV lithographyEUV光刻中环氧交联分子玻璃光刻胶的优化策略
err2024-08-01
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PREAI
errGao, Jiaxing; Zhang, Siliang; Cui, Xuewen; Cong, Xue; Guo, Xudong; Hu, Rui; Wang, Shuangqing; Chen, Jinping; Li, Yi; Tian, Peng; Vockenhuber, Michaela; Kazazis, Dimitrios; Ekinci, Yasin; Yang, Guoqiang
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Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography
err2023-07-23
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errZhang, Siliang; Chen, Long; Gao, Jiaxing; Cui, Xuewen; Cong, Xue; Guo, Xudong; Hu, Rui; Wang, Shuangqing; Chen, Jinping; Li, Yi; Yang, Guoqiang
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Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist分子玻璃负性光刻胶电子束光刻的有效优化策略
err2023-06-16
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errOAAI
errGao, Jiaxing; Zhang, Siliang; Cui, Xuewen; Cong, Xue; Guo, Xudong; Hu, Rui; Wang, Shuangqing; Chen, Jinping; Li, Yi; Yang, Guoqiang
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IF0
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PREAI
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