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Sherry L. Baker

united states department of energy (doe)

22H指数
100论文数
1.3K被引数
收录论文 7
发表时间
Spontaneously intermixed Al-Mg barriers enable corrosion-resistant Mg/SiC multilayer coatings
err2012-07-23
err30
errOAAI
errSoufli, Regina; Fernandez-Perea, Monica; Baker, Sherry L.; Robinson, Jeff C.; Alameda, Jennifer; Walton, Christopher C.
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Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser
err2010-10-29
err42
errOAAI
errHau-Riege, S. P.; London, R. A.; Graf, A.; Baker, S. L.; Soufli, R.; Sobierajski, R.; Burian, T.; Chalupsky, J.; Juha, L.; Gaudin, J.; Krzywinski, J.; Moeller, S.; Messerschmidt, M.; Bozek, J.; Bostedt, C.
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Wavelength dependence of the damage threshold of inorganic materials under extreme-ultraviolet free-electron-laser irradiation
err2009-09-14
err44
errOAAI
errHau-Riege, S. P.; London, R. A.; Bionta, R. M.; Ryutov, D.; Soufli, R.; Bajt, S.; McKernan, M. A.; Baker, S. L.; Krzywinski, J.; Sobierajski, R.; Nietubyc, R.; Klinger, D.; Pelka, J. B.; Jurek, M.; Juha, L.; Chalupsky, J.; Cihelka, J.; Hajkova, V.; Velyhan, A.; Krasa, J.; Tiedtke, K.; Toleikis, S.; Wabnitz, H.; Bergh, M.; Caleman, C.; Timneanu, N.
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Predicting the coherent X-ray wavefront focal properties at the Linac Coherent Light Source (LCLS) X-ray free electron laser
err2009-08-18
err61
errOAAI
errBarty, Anton; Soufli, Regina; McCarville, Tom; Baker, Sherry L.; Pivovaroff, Michael J.; Stefan, Peter; Bionta, Richard
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Multiple pulse thermal damage thresholds of materials for x-ray free electron laser optics investigated with an ultraviolet laser用紫外激光研究x射线自由电子激光光学材料的多脉冲热损伤阈值
err2008-11-19
err12
errOAAI
errHau-Riege, Stefan P.; London, Richard A.; Bionta, Richard M.; Soufli, Regina; Ryutov, Dmitri; Shirk, Michael; Baker, Sherry L.; Smith, Patrick M.; Nataraj, Pradeep
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Damage threshold of inorganic solids under free-electron-laser irradiation at 32.5 nm wavelength
err2007-04-27
err80
errOAAI
errHau-Riege, S. P.; London, R. A.; Bionta, R. M.; McKernan, M. A.; Baker, S. L.; Krzywinski, J.; Sobierajski, R.; Nietubyc, R.; Pelka, J. B.; Jurek, M.; Juha, L.; Chalupsky, J.; Cihelka, J.; Hajkova, V.; Velyhan, A.; Krasa, J.; Kuba, J.; Tiedtke, K.; Toleikis, S.; Tschentscher, Th.; Wabnitz, H.; Bergh, M.; Caleman, C.; Sokolowski-Tinten, K.; Stojanovic, N.; Zastrau, U.
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Ultrathick, low-stress nanostructured diamond films -: art. no. 221914
err2005-05-30
err14
errOAAI
errKucheyev, SO; Biener, J; Tringe, JW; Wang, YM; Mirkarimi, PB; van Buuren, T; Baker, SL; Hamza, AV; Brühne, K; Fecht, HJ
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