未登录Atomic layer deposited iridium-ruthenium precious nanolaminate heterointerface electrodes for next-generation electrocatalysts原子层沉积的铱-钌贵金属纳米层异质界面电极用于下一代电催化剂
Mohapatra, Debananda; Ramesh, Rahul; Son, Yeseul; Park, Nayeon; Nandi, Dip K.; Cheon, Taehoon; Harada, Ryosuke; Shigetomi, Toshiyuki; Suzuki, Kazuharu; Choi, Kyoung Jin; Kim, Soo-Hyun
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收藏Small and Simple Molecular Structure Based Thermally Stable Ruthenium Precursor in Advancing Ruthenium ALD Process for Scaled Interconnect Metallization基于小而简单分子结构的热稳定钌前驱体在推进钌ALD工艺用于缩放互连金属化中的应用
Nakatsubo, Hideaki; Mohapatra, Debananda; Lee, Eun-Soo; Kim, Jeongha; Cho, Iaan; Iseki, Masato; Shigetomi, Toshiyuki; Harada, Ryosuke; Na, Sang-Woong; Cheon, Taehoon; Shong, Bonggeun; Kim, Soo-Hyun
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收藏Mo-based MXenes: Synthesis, properties, and applications钼基MXenes: 合成、性质和应用
Hussain, Iftikhar; Amara, Umay; Bibi, Faiza; Hanan, Abdul; Lakhan, Muhammad Nazim; Soomro, Irfan Ali; Khan, Amjad; Shaheen, Irum; Sajjad, Uzair; Rani, Gokana Mohana; Javed, Muhammad Sufyan; Khan, Karim; Hanif, Muhammad Bilal; Assiri, Mohammed A.; Sahoo, Sumanta; Al Zoubi, Wail; Mohapatra, Debananda; Zhang, Kaili
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收藏Self-Formation of a Ru/ZnO Multifunctional Bilayer for the Next-Generation Interconnect Technology via Area-Selective Atomic Layer Deposition通过区域选择性原子层沉积自形成用于下一代互连技术的Ru/ZnO多功能双层
Mori, Yuki; Cheon, Taehoon; Kotsugi, Yohei; Kim, Youn-Hye; Park, Yejin; Ansari, Mohd Zahid; Mohapatra, Debananda; Jang, Yujin; Bae, Jong-Seong; Kwon, Woobin; Kim, Gahui; Park, Young-Bae; Lee, Han-Bo-Ram; Song, Wooseok; Kim, Soo-Hyun
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收藏Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru-Interconnects
Kim, Youn-Hye; Kim, Minsu; Kotsugi, Yohei; Cheon, Taehoon; Mohapatra, Debananda; Jang, Yujin; Bae, Jong-Seong; Hong, Tae Eun; Ramesh, Rahul; An, Ki-Seok; Kim, Soo-Hyun
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