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B. Hackens

uclouvain
H指数:25
被引数:1,765

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A High-Resolution EUV Zinc-Oximate Resist: Why Post-exposure Bake Fails to Improve Lithography Performance

高分辨率EUV锌-氧肟酸盐抗蚀剂:为何后曝光烘烤无法改善光刻性能

2026-04-290
PRE
Quantifying the local mechanical properties of twisted double bilayer graphene
2023-01-011
OA