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K

Kazuya Yamamura

University of Osaka

45H指数
376论文数
6.6K被引数
收录论文 67
发表时间
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Interfacial hole-flux regulation enables uniform slurry-less photoelectrochemical mechanical polishing of doping-inhomogeneous GaN界面空穴通量调控实现了无浆料光电化学机械抛光非均匀掺杂GaN
errJournal of Materials Processing Technology
IF7.5
err2026-08-01
err0
PREAI
errOhnishi, Yuya; Sun, Rongyan; Usami, Shigeyoshi; Ohkubo, Yuji; Imanishi, Masayuki; Mori, Yusuke; Yamamura, Kazuya
err分享
err收藏
Morphologies, formation mechanisms, and mitigation strategies of groove-type scratches and ridge-type traces in slurry-less ECMP of 4H-SiC无浆料4H-SiC电化学机械抛光中槽型划痕和脊型痕迹的形貌、形成机制及缓解策略
errCIRP ANNALS-MANUFACTURING TECHNOLOGY
IF3.6
err2026-05-22
err0
errOAAI
errRongyan Sun; Aoi Kaneko; Yuji Ohkubo; Kazuya Yamamura
err分享
err收藏
Mechanism-guided control of high-spatial-frequency roughness in small-diameter plasma jet machining by suppressing near-surface vortex-induced transport通过抑制近表面涡流诱导输运，对小型等离子体射流加工中的高空间频率粗糙度进行机理引导控制
errInternational Journal of Machine Tools and Manufacture
IF18.8
err2026-05-19
err0
errOAAI
errXinyang Wei; Rongyan Sun; Kazuya Yamamura
err分享
err收藏
Physical properties and polishing characteristics of laser induced heat affected zone on diamond surfaces激光诱导的热影响区在金刚石表面的物理性质与抛光特性
errDiamond and Related Materials
IF5.1
err2026-04-02
err0
PREAI
errJiayuan Dong; Rongyan Sun; Yuji Ohkubo; Kazuya Yamamura
err分享
err收藏
Plasma-assisted polishing with self-limiting surface modification for sub-nanometer finishing of AlN ceramics等离子体辅助抛光结合自限制表面改性技术用于AlN陶瓷的亚纳米级精加工
errCeramics International
IF5.6
err2026-02-10
err0
PREAI
errTong Tao; Rongyan Sun; Yuji Ohkubo; Kazuya Yamamura
err分享
err收藏
Plasma-assisted polishing with silicon and silica plates: Comparison of interaction mechanism and achievement of atomically flat surfaces on single- and polycrystalline diamond硅和二氧化硅基板辅助的等离子体抛光：单晶和多晶金刚石相互作用机制与原子级平整表面制备的比较
errJournal of Materials Processing Technology
IF7.5
err2025-12-16
err0
PREAI
errJiayuan Dong; Sota Sugihara; Kafumi Fujiwara; Rongyan Sun; Yuji Ohkubo; Junsha Wang; Tadatomo Suga; Kazuya Yamamura
err分享
err收藏
High-efficiency modification mechanism of GaN(0001) in plasma-assisted polishing using hydrogen plasma氢等离子体辅助抛光中GaN(0001)的高效改性机理
errCIRP Annals
IF0
err2025-04-26
err0
PREAI
errTong Tao; Rongyan Sun; Yuji Ohkubo; Kazuya Yamamura
err分享
err收藏
An interior damage free approach for nanosecond pulsed laser ablation of single crystal diamond via metal film induced self-maintaining graphitization
errJOURNAL OF MANUFACTURING PROCESSES
IF6.8
err2024-12-01
err3
PREAI
errLiu, Nian; Zhu, Jingming; Lei, Ling; Lu, Hao; Xiao, Junfeng; Zhang, Jianguo; Chen, Xiao; Xu, Jianfeng; Yamamura, Kazuya
err分享
err收藏
A highly efficient semi-finishing approach for polycrystalline diamond film via plasma-based anisotropic etching通过基于等离子体的各向异性蚀刻对多晶金刚石膜进行高效半精加工的方法
errJOURNAL OF MATERIALS PROCESSING TECHNOLOGY
IF7.5
err2024-11-01
err1
PREAI
errLiu, Nian; Lei, Ling; Jiang, Huilong; Zhang, Yongjie; Xiao, Junfeng; Zhang, Jianguo; Chen, Xiao; Xu, Jianfeng; Yamamura, Kazuya
err分享
err收藏
Insights into the atomic-scale removal mechanism of single crystal diamond in plasma-assisted polishing with quartz glass
errTRIBOLOGY INTERNATIONAL
IF6.9
err2024-06-01
err2
PREAI
errLiu, Nian; Jiang, Huilong; Xiao, Junfeng; Zhang, Jianguo; Chen, Xiao; Zhu, Jingming; Xu, Jianfeng; Yamamura, Kazuya
err分享
err收藏
Identification of chemical species on plasma-treated polytetrafluoroethylene surface by ab-initio calculations of core-energy-level shift in X-ray photoelectron spectra
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-05-01
err4
errOAAI
errNishino, Misa; Inagaki, Kouji; Morikawa, Yoshitada; Yamamura, Kazuya; Ohkubo, Yuji
err分享
err收藏
Effects of electrolyte type and concentration on the anodic oxidation of 4H-SiC (0001) in slurryless electrochemical mechanical polishing无浆料电化学机械抛光中电解质类型和浓度对4H-SiC (0001) 阳极氧化的影响
errELECTROCHIMICA ACTA
IF5.6
err2024-01-01
err4
PREAI
errYang, Xiaozhe; Yang, Xu; Yamamura, Kazuya
err分享
err收藏
Oxidation mechanism of 4H-SiC in slurry-less ECMP with weak alkaline electrolyte弱碱性电解液无浆料ECMP中4H-SiC的氧化机理
errCIRP ANNALS-MANUFACTURING TECHNOLOGY
IF3.6
err2024-01-01
err2
PREAI
errSun, Rongyan; Kinoshita, Ryosuke; Aoki, Kazufumi; Hayakawa, Shota; Hori, Kantaro; Yasuda, Koichiro; Ohkubo, Yuji; Yamamura, Kazuya
err分享
err收藏
Slurryless electrochemical mechanical polishing of 4-inch 4H-SiC (0001) and (000-1) surfaces
errPRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
IF3.7
err2023-09-01
err13
errOAAI
errYang, Xu; Yang, Xiaozhe; Aoki, Kazufumi; Yamamura, Kazuya
err分享
err收藏
Highly efficient finishing of large-sized single crystal diamond substrates by combining nanosecond pulsed laser trimming and plasma-assisted polishing纳秒脉冲激光修边与等离子体辅助抛光相结合的大尺寸单晶金刚石基片的高效光整加工
errCERAMICS INTERNATIONAL
IF5.6
err2023-06-01
err13
errOAAI
errLiu, Nian; Sugimoto, Kentaro; Yoshitaka, Naoya; Yamada, Hideaki; Sun, Rongyan; Arima, Kenta; Yamamura, Kazuya
err分享
err收藏
Separation of Neighboring Terraces on a Flattened Si(111) Surface by Selective Etching along Step Edges Using Total Wet Chemical Processing
errLANGMUIR
IF3.9
err2022-03-17
err0
PREAI
errMa, Zhida; Masumoto, Seiya; Kawai, Kentaro; Yamamura, Kazuya; Arima, Kenta
err分享
err收藏
Efficient and slurryless ultrasonic vibration assisted electrochemical mechanical polishing for 4H-SiC wafers高效无浆超声振动辅助电化学机械抛光4H-SiC晶片
errCERAMICS INTERNATIONAL
IF5.6
err2022-03-01
err37
errOAAI
errYang, Xiaozhe; Yang, Xu; Gu, Haiyang; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya
err分享
err收藏
Charge Utilization Efficiency and Side Reactions in the Electrochemical Mechanical Polishing of 4H-SiC (0001)
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2022-02-01
err12
PREAI
errYang, Xiaozhe; Yang, Xu; Gu, Haiyang; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya
err分享
err收藏
Novel highly-efficient and dress-free polishing technique with plasma-assisted surface modification and dressing
errPRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
IF3.7
err2021-11-01
err13
errOAAI
errSun, Rongyan; Nozoe, Atsunori; Nagahashi, Junji; Arima, Kenta; Kawai, Kentaro; Yamamura, Kazuya
err分享
err收藏
Novel SiC wafer manufacturing process employing three-step slurryless electrochemical mechanical polishing采用三步无浆电化学机械抛光的新型SiC晶片制造工艺
errJOURNAL OF MANUFACTURING PROCESSES
IF6.8
err2021-10-01
err27
PREAI
errYang, Xu; Yang, Xiaozhe; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya
err分享
err收藏

研究方向

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合作学者
合作期刊
K
Kazuto Nishio
H 指数: 81 · 论文数: 1.1K
T
Tetsuya Ishikawa
H 指数: 79 · 论文数: 1.1K
M
Makina Yabashi
H 指数: 75 · 论文数: 1.0K
刘念 封面图
刘念 (Nian Liu)
H 指数: 75 · 论文数: 427
陈
陈骁 (Xiao Chen)
H 指数: 62 · 论文数: 383
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