Ezra Bussmann - Publications, H-index & Citations

Ezra Bussmann

sandia national laboratory

17H指数

138论文数

762被引数

收录论文 22

发表时间

Deep generative learning of magnetic frustration in artificial spin ice from magnetic force microscopy images 从磁力显微镜图像对人工自旋冰中的磁挫折进行深度生成学习

npj Computational Materials

IF11.9

2026-05-20

OAAI

Arnab Neogi; Suryakant Mishra; Prasad P. Iyer; Tzu-Ming Lu; Ezra Bussmann; Sergei Tretiak; Andrew C. Jones; Jian-Xin Zhu

A Reduced-Temperature Process for Preparing Atomically Clean Si(100) and SiGe(100) Surfaces with Vapor HF 一种用于制备原子级清洁Si(100)和SiGe(100)表面的低温工艺（采用气相HF）

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2025-05-06

PREAI

Pena, Luis Fabian; Anderson, Evan M.; Mudrick, John P.; Rosenberg, Samantha G.; Scrymgeour, David A.; Bussmann, Ezra; Misra, Shashank

Atomic Precision Processing of Two-Dimensional Materials for Next-Generation Microelectronics

ACS NANO

IF16

2024-08-06

PREAI

Yoo, Jinkyoung; Nam, Chang-Yong; Bussmann, Ezra

Modeling Si/SiGe quantum dot variability induced by interface disorder reconstructed from multiperspective microscopy

NPJ QUANTUM INFORMATION

IF8.3

2024-03-27

OAAI

Pena, Luis Fabian; Koepke, Justine C.; Dycus, Joseph Houston; Mounce, Andrew; Baczewski, Andrew D.; Jacobson, N. Tobias; Bussmann, Ezra

Quantifying the Variation in the Number of Donors in Quantum Dots Created Using Atomic Precision Advanced Manufacturing

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2023-03-15

PREAI

Campbell, Quinn T.; Koepke, Justine C.; Ivie, Jeffrey A.; Mounce, Andrew M.; Ward, Daniel R.; Carroll, Malcolm S.; Misra, Shashank; Baczewski, Andrew D.; Bussmann, Ezra

Impact of Incorporation Kinetics on Device Fabrication with Atomic Precision

PHYSICAL REVIEW APPLIED

IF4.4

2021-11-18

OAAI

Ivie, Jeffrey A.; Campbell, Quinn; Koepke, Justin C.; Brickson, Mitchell, I; Schultz, Peter A.; Muller, Richard P.; Mounce, Andrew M.; Ward, Daniel R.; Carroll, Malcolm S.; Bussmann, Ezra; Baczewski, Andrew D.; Misra, Shashank

Atomic-precision advanced manufacturing for Si quantum computing

MRS BULLETIN

IF4.9

2021-08-03

OAAI

Bussmann, Ezra; Butera, Robert E.; Owen, James H. G.; Randall, John N.; Rinaldi, Steven M.; Baczewski, Andrew D.; Misra, Shashank

First-principles calculations of metal surfaces. II. Properties of low-index platinum surfaces toward understanding electron emission

PHYSICAL REVIEW B

IF3.7

2021-05-20

OAAI

Schultz, Peter A.; Hjalmarson, Harold P.; Berg, Morgann; Bussmann, Ezra; Scrymgeour, David A.; Ohta, Taisuke; Moore, Chris H.

AlCl3-Dosed Si(100)-2 x 1: Adsorbates, Chlorinated Al Chains, and Incorporated Al

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2021-05-19

OAAI

Radue, Matthew S.; Baek, Sungha; Farzaneh, Azadeh; Dwyer, K. J.; Campbell, Quinn; Baczewski, Andrew D.; Bussmann, Ezra; Wang, George T.; Mo, Yifei; Misra, Shashank; Butera, R. E.

A Model for Atomic Precision p-Type Doping with Diborane on Si(100)-2x1

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2021-01-06

OAAI

Campbell, Quinn; Ivie, Jeffrey A.; Bussmann, Ezra; Schmucker, Scott W.; Baczewski, Andrew D.; Misra, Shashank

Atomic-layer doping of SiGe heterostructures for atomic-precision donor devices

PHYSICAL REVIEW MATERIALS

IF3.4

2018-06-21

OAAI

Bussmann, E.; Gamble, John King; Koepke, J. C.; Laroche, D.; Huang, S. H.; Chuang, Y.; Li, J. -Y.; Liu, C. W.; Swartzentruber, B. S.; Lilly, M. P.; Carroll, M. S.; Lu, T-M.

Determining the resolution of scanning microwave impedance microscopy using atomic-precision buried donor structures 使用原子精确掩埋施主结构确定扫描微波阻抗显微镜的分辨率

APPLIED SURFACE SCIENCE

IF6.9

2017-11-01

OAAI

Scrymgeour, D. A.; Baca, A.; Fishgrab, K.; Simonson, R. J.; Marshall, M.; Bussmann, E.; Nakakura, C. Y.; Anderson, M.; Misra, S.

Catalytically enhanced thermal decomposition of chemically grown silicon oxide layers on Si(001)

APPLIED PHYSICS LETTERS

IF3.6

2016-03-15

PREAI

Leroy, F.; Passanante, T.; Cheynis, F.; Curiotto, S.; Bussmann, E. B.; Mueller, P.