Taewook Nam - Publications, H-index & Citations

Taewook Nam

Sejong University

19H指数

47论文数

2.4K被引数

收录论文 25

发表时间

Effect of crystalline phase on the thermal atomic layer etching of aluminum oxide: a first-principles study 晶相效应对氧化铝热原子层刻蚀的影响：第一性原理研究

Computational Materials Science

IF3.3

2026-07-01

PREAI

Ar-Raihan, Muhammad Hasbi; Khumaini, Khabib; Kim, Hye-Lee; Nam, Taewook; Lee, Won-Jun

Dimer Formation as the Key Removal Pathway in the Isotropic Atomic Layer Etching of Al2O3: A First-Principles Study 二聚体形成作为Al₂O₃各向同性原子层刻蚀的关键去除路径：一项第一性原理研究

Chemistry of Materials

IF7

2026-03-05

PREAI

Khabib Khumaini; Hye-Lee Kim; Taewook Nam; Won-Jun Lee

Thermal Atomic Layer Etching of Zinc Oxide from 30-300 °C Using Sequential Exposures of Hydrogen Fluoride and Trimethylgallium 使用氢氟酸和三甲基镓顺序暴露法在30-300 °C下对氧化锌进行热原子层刻蚀

CHEMISTRY OF MATERIALS

IF7

2025-03-31

PREAI

Nam, Taewook; Zywotko, David R.; Colleran, Troy A.; Partridge, Jonathan L.; George, Steven M.

Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions 使用顺序氧化和脱氧氯化反应对钼进行热原子层蚀刻

CHEMISTRY OF MATERIALS

IF7

2024-01-29

PREAI

Nam, Taewook; Colleran, Troy A.; Partridge, Jonathan L.; Cavanagh, Andrew S.; George, Steven M.

Thermal Atomic Layer Etching of Zinc Sulfide Using Sequential Trimethylaluminum and Hydrogen Fluoride Exposures: Evidence for a Conversion Mechanism 使用顺序的三甲基铝和氟化氢暴露对硫化锌进行热原子层蚀刻: 转化机制的证据

CHEMISTRY OF MATERIALS

IF7

2023-08-16

PREAI

Nam, Taewook; Partridge, Jonathan L.; George, Steven M.

Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors

APPLIED SURFACE SCIENCE

IF6.9

2021-12-01

PREAI

Lee, Yujin; Seo, Seunggi; Nam, Taewook; Lee, Hyunho; Yoon, Hwi; Sun, Sangkyu; Oh, Il-Kwon; Lee, Sanghun; Shong, Bonggeun; Seo, Jin Hyung; Seok, Jang Hyeon; Kim, Hyungjun

Hydrogen Barriers Based on Chemical Trapping Using Chemically Modulated Al2O3 Grown by Atomic Layer Deposition for InGaZnO Thin-Film Transistors 基于化学捕获的氢势垒，使用通过原子层沉积生长的化学调制Al2O3用于InGaZnO薄膜晶体管

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2021-04-05

PREAI

Lee, Yujin; Nam, Taewook; Seo, Seunggi; Yoon, Hwi; Oh, Il-Kwon; Lee, Chong Hwon; Yoo, Hyukjoon; Kim, Hyun Jae; Choi, Wonjun; Im, Seongil; Yang, Joon Young; Choi, Dong Wook; Yoo, Choongkeun; Kim, Ho-Jin; Kim, Hyungjun

MoS2 doping by atomic layer deposition of high-k dielectrics using alcohol as process oxidants

APPLIED SURFACE SCIENCE

IF6.9

2021-03-01

PREAI

Woo, Whang Je; Seo, Seunggi; Nam, Taewook; Kim, Youngjun; Kim, Donghyun; Song, Jeong-Gyu; Oh, Il-Kwon; Lim, Jun Hyung; Kim, Hyung-Jun; Kim, Hyungjun

Impaired AKT signaling and lung tumorigenesis by PIERCE1 ablation in KRAS-mutant non-small cell lung cancer

ONCOGENE

IF7.3

2020-07-29

OAAI

Roh, Jae-il; Lee, Jaehoon; Sung, Young-Hoon; Oh, Jahyun; Hyeon, Do Young; Kim, Yujin; Lee, Seungeon; Devkota, Sushil; Kim, Hye Jeong; Park, Bomin; Nam, Taewook; Song, Yaechan; Kim, Yonghwan; Hwang, Daehee; Lee, Han-Woong

Comparative study on atomic layer deposition of HfO2via substitution of ligand structure with cyclopentadiene

JOURNAL OF MATERIALS CHEMISTRY C

IF5.1

2020-01-01

PREAI

Park, Sungmin; Park, Bo-Eun; Yoon, Hwi; Lee, Sanghun; Nam, Taewook; Cheon, Taehoon; Kim, Soo-Hyun; Cheon, Hwansung; Im, Sangkyun; Seong, Taegeun; Kim, Hyungjun

Moisture barrier properties of low-temperature atomic layer deposited Al2O3 using various oxidants

CERAMICS INTERNATIONAL

IF5.6

2019-10-01

PREAI

Nam, Taewook; Lee, Haksoo; Seo, Seunggi; Cho, Sung Min; Shong, Bonggeun; Lee, Han-Bo-Ram; Kim, Hyungjun

Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor

APPLIED SURFACE SCIENCE

IF6.9

2019-08-01

PREAI

Nam, Taewook; Lee, Hyunho; Choi, Taejin; Seo, Seunggi; Yoon, Chang Mo; Choi, Yunjung; Jeong, Heonjong; Lingam, Hima K.; Chitturi, Venkateswara R.; Korolev, Andrey; Ahn, Jong-Hyun; Kim, Hyungjun

Hydrogen barrier performance of sputtered La2O3 films for InGaZnO thin-film transistor

JOURNAL OF MATERIALS SCIENCE

IF3.9

2019-05-13

PREAI

Lee, Yujin; Lee, Chong Hwon; Nam, Taewook; Lee, Sanghun; Oh, Il-Kwon; Yang, Joon Young; Choi, Dong Wook; Yoo, Choongkeun; Kim, Ho-jin; Kim, Woo-Hee; Kim, Hyungjun

Molecular oxidation of surface -CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3 : A theoretical study

APPLIED SURFACE SCIENCE

IF6.9

2018-11-01

PREAI

Seo, Seunggi; Nam, Taewook; Lee, Han-Bo-Ram; Kim, Hyungjun; Shong, Bonggeun

Cobalt titanium nitride amorphous metal alloys by atomic layer deposition

JOURNAL OF ALLOYS AND COMPOUNDS

IF6.3

2018-03-01

PREAI

Nam, Taewook; Lee, Chang Wan; Cheon, Taehoon; Lee, Woo Jae; Kim, Soo-Hyun; Kwon, Se-Hun; Lee, Han-Bo-Ram; Kim, Hyungjun

High-Performance Ink-Synthesized Cu-Gate Thin-Film Transistor with Diffusion Barrier Formation

METALS AND MATERIALS INTERNATIONAL

IF4

2018-02-28

PREAI

Woo, Whang Je; Nam, Taewook; Oh, Il-Kwon; Maeng, Wanjoo; Kim, Hyungjun

Emerging Paradigm of Crosstalk between Autophagy and the Ubiquitin-Proteasome System

MOLECULES AND CELLS

IF6.5

2017-12-01

104

PREAI

Nam, Taewook; Han, Jong Hyun; Devkota, Sushil; Lee, Han-Woong

Surface-Localized Sealing of Porous Ultralow-k Dielectric Films with Ultrathin (<2 nm) Polymer Coating

ACS NANO

IF16

2017-07-25

PREAI

Yoon, Seong Jun; Pak, Kwanyong; Taewook Nam; Yoon, Alexander; Kim, Hyungjun; Im, Sung Gap; Cho, Byung Jin

Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition

APPLIED SURFACE SCIENCE

IF6.9

2014-03-01

PREAI

Nam, Taewook; Lee, Chang Wan; Kim, Hyun Jae; Kim, Hyungjun

Graphene as an atomically thin barrier to Cu diffusion into Si

NANOSCALE

IF5.1

2014-01-01

PREAI

Hong, Juree; Lee, Sanggeun; Lee, Seulah; Han, Heetak; Mahata, Chandreswar; Yeon, Han-Wool; Koo, Bonwoong; Kim, Seong-Il; Nam, Taewook; Byun, Kisik; Min, Byung-Wook; Kim, Young-Woon; Kim, Hyungjun; Joo, Young-Chang; Lee, Taeyoon

研究方向