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A

Andrei Dolocan

texas materials institute
H指数:48
被引数:9,163

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Revealing the EuCd2As2 Semiconducting Band Gap via n-Type La-Doping

通过n型La掺杂揭示EuCd2As2半导体带隙

CHEMISTRY OF MATERIALS
IF7
2024-07-242
OA
Nelson, Ryan A.; King, Jesaiah; Cheng, Shuyu; Williams, Archibald J.; Jozwiak, Chris; Bostwick, Aaron; Rotenberg, Eli; Sasmal, Souvik; Kao, I-Hsuan; Tiwari, Aalok; Jones, Natalie R.; Cai, Chuting; Martin, Emma; Dolocan, Andrei; Shi, Li; Kawakami, Roland K.; Heremans, Joseph P.; Katoch, Jyoti; Goldberger, Joshua E.
Transition metal incorporation: electrochemical, structure, and chemical composition effects on nickel oxyhydroxide oxygen-evolution electrocatalysts

过渡金属掺入: 电化学，结构和化学成分对羟基氧化镍析氧电催化剂的影响

ENERGY & ENVIRONMENTAL SCIENCE
IF30.8
2024-01-0120
OA
Marquez, Raul A.; Kalokowski, Emma; Espinosa, Michael; Bender, Jay T.; Son, Yoon Jun; Kawashima, Kenta; Chukwuneke, Chikaodili E.; Smith, Lettie A.; Celio, Hugo; Dolocan, Andrei; Zhan, Xun; Miller, Nathaniel; Milliron, Delia J.; Resasco, Joaquin; Mullins, C. Buddie

研究方向

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C
C. Buddie Mullins
H 指数:89论文数:533被引数:2.7万
A
Arumugam Manthiram
H 指数:168论文数:1,329被引数:12.4万
H
Hugo Celio
H 指数:34论文数:102被引数:4,455
W
Wangda Li
H 指数:27论文数:32被引数:9,035
A
Adam Heller
H 指数:104论文数:446被引数:3.4万
J
Jason A. Weeks
H 指数:17论文数:41被引数:1,342
Y
Yixian Wang
H 指数:26论文数:86被引数:2,682
J
John B. Goodenough
H 指数:183论文数:1,441被引数:17.0万
Y
Yutao Li
H 指数:75论文数:163被引数:2.2万
R
Rodrigo Rodríguez
H 指数:13论文数:17被引数:798