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D

Diederik Depla

ghent university

46H指数
305论文数
9.1K被引数
收录论文 111
发表时间
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Interplay between energetic bombardment and interface chemistry on phase evolution of sputter deposited tungsten filmsenergetic bombardment和界面化学对磁控溅射沉积钨薄膜相演化的相互作用
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2026-08-28
err0
PREAI
errF.A. Farahani; D. Depla
err分享
err收藏
On the correlation between the impurity-to-metal flux ratio and the thin film impurity content杂质通量比与薄膜杂质含量之间的关系
errSurface and Coatings Technology
IF6.1
err2026-05-12
err0
PREAI
errDiederik Depla; Farzaneh Ahangarani Farahani; Stanislav Mráz
err分享
err收藏
Further evidence for double hysteresis behavior during reactive magnetron sputtering关于反应磁控溅射过程中双迟滞行为的进一步证据
errSurface and Coatings Technology
IF6.1
err2025-11-27
err0
PREAI
errD. Depla; K. Strijckmans
err分享
err收藏
Growth mechanisms and mechanical response of 3D superstructured cubic and hexagonal Hf1-xAlxN thin films3D超结构立方和六方Hf1-xAlxN薄膜的生长机制和力学响应
errActa Materialia
IF9.3
err2025-10-27
err0
errOAAI
errMarcus Lorentzon; Naoki Takata; Diederik Depla; Tianqi Zhu; Grzegorz Greczynski; Rainer Hahn; Anton Zubayer; Justinas Palisaitis; Helmut Riedl; Dasom Kim; Lars Hultman; Jens Birch; Naureen Ghafoor
err分享
err收藏
The role of backscattered neutrals on the phase composition of sputter deposited tungsten thin films背散射中子在溅射沉积钨薄膜相组成中的作用
errApplied Surface Science
IF6.9
err2025-10-24
err0
PREAI
errF.A. Farahani; M. Akagawa; T. Shimizu; D. Depla
err分享
err收藏
Convergence during feedback controlled reactive magnetron sputtering: Mechanisms and classification反馈控制反应磁控溅射过程中的收敛：机制与分类
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2025-07-01
err0
PREAI
errVan Bever, J.; Strijckmans, K.; Konstantinidis, S.; Depla, D.
err分享
err收藏
A python-based approach to sputter deposition simulations in combinatorial materials science
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2025-05-01
err0
errOAAI
errThelen, F.; Zehl, R.; Buergel, J. L.; Depla, D.; Ludwig, A.
err分享
err收藏
Industrial reactive sputter deposition of TiZrN coatings: The role of nitrogen partial pressure
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2025-03-01
err0
PREAI
errBehrangi, Sahand; Depla, Diederik; Soucek, Pavel; Czigany, Zsolt; Bursikova, Vilma; Balazsi, Katalin; Vasina, Petr
err分享
err收藏
Note on the low deposition rate during reactive magnetron sputtering
errVACUUM
IF3.9
err2024-10-01
err1
PREAI
errDepla, D.
err分享
err收藏
Floating potential probes for process control during reactive magnetron sputtering
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2024-10-01
err0
PREAI
errVan Bever, J.; Vasina, P.; Drevet, R.; Strijckmans, K.; Depla, D.
err分享
err收藏
Phase composition of sputter deposited tungsten thin films
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2024-10-01
err0
PREAI
errFarahani, F. Ahangarani; Depla, D.
err分享
err收藏
Calculation of oxide sputter yields
errVACUUM
IF3.9
err2024-04-01
err4
errOAAI
errDepla, D.; Van Bever, J.
err分享
err收藏
On the role of chemisorption in the formation of the target surface compound layer during reactive magnetron sputtering
errVACUUM
IF3.9
err2023-11-01
err1
errOAAI
errDepla, D.
err分享
err收藏
The measurement and impact of negative oxygen ions during reactive sputter deposition反应溅射沉积过程中负氧离子的测量及影响
errCRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES
IF8.9
err2023-09-21
err2
errOAAI
errDepla, D.
err分享
err收藏
Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering
errAPPLIED SURFACE SCIENCE
IF6.9
err2023-03-01
err4
errOAAI
errVan Bever, Josja; Strijckmans, Koen; Depla, Diederik
err分享
err收藏
Analysis of stress in sputter-deposited films using a kinetic model for Cu, Ni, Co, Cr, Mo, W使用Cu，Ni，Co，Cr，Mo，W的动力学模型分析溅射沉积膜中的应力
errAPPLIED SURFACE SCIENCE
IF6.9
err2023-03-01
err6
errOAAI
errSu, Tong; Rao, Zhaoxia; Berman, Sarah; Depla, Diederik; Chason, Eric
err分享
err收藏
Linking simulated polycrystalline thin film microstructures to physical vapor deposition conditions
errACTA MATERIALIA
IF9.3
err2023-02-01
err16
errOAAI
errMonti, Joseph M.; Stewart, James A.; Custer, Joyce O.; Adams, David P.; Depla, Diederik; Dingreville, Remi
err分享
err收藏
Effect of Growth Temperature and Atmosphere Exposure Time on Impurity Incorporation in Sputtered Mg, Al, and Ca Thin Films生长温度和大气暴露时间对溅射Mg，Al和Ca薄膜中杂质掺入的影响
errMATERIALS
IF3.2
err2023-01-01
err6
errOAAI
errAliramaji, Shamsa; Keuter, Philipp; Neuss, Deborah; Hans, Marcus; Primetzhofer, Daniel; Depla, Diederik; Schneider, Jochen M.
err分享
err收藏
Cell Behavior Changes and Enzymatic Biodegradation of Hybrid Electrospun Poly(3-hydroxybutyrate)-Based Scaffolds with an Enhanced Piezoresponse after the Addition of Reduced Graphene Oxide添加还原的氧化石墨烯后，具有增强的压电响应的基于混合电纺聚 (3-羟基丁酸酯) 的支架的细胞行为变化和酶促生物降解
errADVANCED HEALTHCARE MATERIALS
IF9.6
err2023-01-01
err4
errOAAI
errChernozem, Roman V.; Pariy, Igor; Surmeneva, Maria A.; Shvartsman, Vladimir V.; Planckaert, Guillaume; Verduijn, Joost; Ghysels, Stef; Abalymov, Anatolii; Parakhonskiy, Bogdan V.; Gracey, Eric; Goncalves, Amanda; Mathur, Sanjay; Ronsse, Frederik; Depla, Diederik; Lupascu, Doru C.; Elewaut, Dirk; Surmenev, Roman A.; Skirtach, Andre G.
err分享
err收藏
Effect of processing conditions on residual stress in sputtered transition metal nitrides (TiN, ZrN and TaN): Experiments and modeling工艺条件对溅射过渡金属氮化物 (TiN，ZrN和TaN) 中残余应力的影响: 实验和建模
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2022-10-01
err10
errOAAI
errRao, Zhaoxia; Su, Tong; Koenig, Thomas; Thompson, Gregory B.; Depla, Diederik; Chason, Eric
err分享
err收藏

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