Tony Schenk - Publications, H-index & Citations

Tony Schenk

ferroelectric memory gmbh (fmc), 01099 dresden, germany

38H指数

85论文数

8.7K被引数

收录论文 33

发表时间

Highly Reliable Hf1-XZrXO2 with Ultra-Low Operation Voltage (< 1 V) Enabled by Stoichiometric Control of Tungsten Oxide Interfacial Layer 通过钨氧化物界面层的化学计量控制实现的超低工作电压（< 1 V）高可靠性Hf1-XZrXO2

Advanced Materials Technologies

IF6.2

2025-07-08

OAAI

Mostafa Habibi; Alireza Kashir; Tony Schenk; Hojung Jang; Seungyeol Oh; Jaeseon Kim; Geonhui Han; Donghwa Lee; Foroozan Koushan; Hyunsang Hwang

Demonstration of 1 V Reliable FeRAM Operation: V c Engineering Using Quasi-Chirality of Hf1-x Zr x O2 in a Nanolaminate Structure

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2024-10-03

PREAI

Jang, Hojung; Kashir, Alireza; Schenk, Tony; Habibi, Mostafa; Schuster, Martin; Oh, Seungyeol; Mueeller, Stefan; Hwang, Hyunsang

Strain as a Global Factor in Stabilizing the Ferroelectric Properties of ZrO2 应变是稳定ZrO2铁电性能的整体因素

ADVANCED FUNCTIONAL MATERIALS

IF19

2023-11-10

OAAI

Xu, Bohan; Lomenzo, Patrick D.; Kersch, Alfred; Schenk, Tony; Richter, Claudia; Fancher, Chris M.; Starschich, Sergej; Berg, Fenja; Reinig, Peter; Holsgrove, Kristina M.; Kiguchi, Takanori; Mikolajick, Thomas; Boettger, Ulrich; Schroeder, Uwe

Quantification of the Electromechanical Measurements by Piezoresponse Force Microscopy 压电响应力显微镜对机电测量的量化

ADVANCED MATERIALS

IF26.8

2022-10-21

OAAI

Buragohain, Pratyush; Lu, Haidong; Richter, Claudia; Schenk, Tony; Kariuki, Pamenas; Glinsek, Sebastjan; Funakubo, Hiroshi; Iniguez, Jorge; Defay, Emmanuel; Schroeder, Uwe; Gruverman, Alexei

Influence of tensile vs. compressive stress on fatigue of lead zirconate titanate thin films

JOURNAL OF THE EUROPEAN CERAMIC SOCIETY

IF6.2

2021-11-01

OAAI

Aruchamy, Naveen; Schenk, Tony; Kovacova, Veronika; Glinsek, Sebastjan; Defay, Emmanuel; Granzow, Torsten

Enhancement of ferroelectricity and orientation in solution-derived hafnia thin films through heterogeneous grain nucleation

APPLIED PHYSICS LETTERS

IF3.6

2021-04-21

OAAI

Schenk, Tony; Bencan, Andreja; Drazic, Goran; Condurache, Oana; Valle, Nathalie; El Adib, Brahime; Aruchamy, Naveen; Granzow, Torsten; Defay, Emmanuel; Glinsek, Sebastjan

Memory technology-a primer for material scientists

REPORTS ON PROGRESS IN PHYSICS

IF20.7

2020-07-16

PREAI

Schenk, T.; Pesic, M.; Slesazeck, S.; Schroeder, U.; Mikolajick, T.

Fully Transparent Friction-Modulation Haptic Device Based on Piezoelectric Thin Film 基于压电薄膜的全透明摩擦调制触觉装置

ADVANCED FUNCTIONAL MATERIALS

IF19

2020-07-02

OAAI

Glinsek, Sebastjan; Mahjoub, Mohamed Aymen; Rupin, Matthieu; Schenk, Tony; Godard, Nicolas; Girod, Stephanie; Chemin, Jean-Baptiste; Leturcq, Renaud; Valle, Nathalie; Klein, Sebastien; Chappaz, Cedrick; Defay, Emmanuel

On the importance of pyrolysis for inkjet-printed oxide piezoelectric thin films

JOURNAL OF MATERIALS CHEMISTRY C

IF5.1

2020-01-01

OAAI

Godard, Nicolas; Mahjoub, Mohamed Aymen; Girod, Stephanie; Schenk, Tony; Glinsek, Sebastjan; Defay, Emmanuel

Local structural investigation of hafnia-zirconia polymorphs in powders and thin films by X-ray absorption spectroscopy 通过x射线吸收光谱法对粉末和薄膜中的氧化铪-氧化锆多晶型物进行局部结构研究

ACTA MATERIALIA

IF9.3

2019-11-01

OAAI

Schenk, Tony; Anspoks, Andris; Jonane, Inga; Ignatans, Reinis; Johnson, Brienne S.; Jones, Jacob L.; Tallarida, Massimo; Marini, Carlo; Simonelli, Laura; Hoenicke, Philipp; Richter, Claudia; Mikolajick, Thomas; Schroeder, Uwe

Fluid Imprint and Inertial Switching in Ferroelectric La:HfO2 Capacitors

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2019-08-28

OAAI

Buragohain, Pratyush; Erickson, Adam; Kariuki, Pamenas; Mittmann, Terence; Richter, Claudia; Lomenzo, Patrick D.; Lu, Haidong; Schenk, Tony; Mikolajick, Thomas; Schroeder, Uwe; Gruverman, Alexei

Study of VO2 thin film synthesis by atomic layer deposition

MATERIALS TODAY CHEMISTRY

IF6.7

2019-06-01

PREAI

Prasadam, V. P.; Dey, B.; Bulou, S.; Schenk, T.; Bahlawane, N.

Physical Approach to Ferroelectric Impedance Spectroscopy: The Rayleigh Element

PHYSICAL REVIEW APPLIED

IF4.4

2018-12-03

OAAI

Schenk, T.; Hoffmann, M.; Pesic, M.; Park, M. H.; Richter, C.; Schroeder, U.; Mikolajick, T.

Genuinely Ferroelectric Sub-1-Volt-Switchable Nanodomains in HfxZr(1-x)O2 Ultrathin Capacitors

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2018-08-14

OAAI

Stolichnov, Igor; Cavalieri, Matteo; Colla, Enrico; Schenk, Tony; Mittmann, Terence; Mikolajick, Thomas; Schroeder, Uwe; Ionescu, Adrian M.

Nanoscopic studies of domain structure dynamics in ferroelectric La: HfO2 capacitors

APPLIED PHYSICS LETTERS

IF3.6

2018-05-31

106

OAAI

Buragohain, P.; Richter, C.; Schenk, T.; Lu, H.; Mikolajick, T.; Schroeder, U.; Gruverman, A.

Pyroelectricity of silicon-doped hafnium oxide thin films

APPLIED PHYSICS LETTERS

IF3.6

2018-04-02

OAAI

Jachalke, Sven; Schenk, Tony; Park, Min Hyuk; Schroeder, Uwe; Mikolajick, Thomas; Stoecker, Hartmut; Mehner, Erik; Meyer, Dirk C.

Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material

INORGANIC CHEMISTRY

IF4.7

2018-02-15

303

OAAI

Schroeder, Uwe; Richter, Claudia; Park, Min Hyuk; Schenk, Tony; Pesic, Milan; Hoffmann, Michael; Fengler, Franz P. G.; Pohl, Darius; Rellinghaus, Bernd; Zhou, Chuanzhen; Chung, Ching-Chang; Jones, Jacob L.; Mikolajick, Thomas

Atomic Structure of Domain and Interphase Boundaries in Ferroelectric HfO2

ADVANCED MATERIALS INTERFACES

IF4.4

2018-01-03

134

OAAI

Grimley, Everett D.; Schenk, Tony; Mikolajick, Thomas; Schroeder, Uwe; LeBeau, James M.

Insights into antiferroelectrics from first-order reversal curves

APPLIED PHYSICS LETTERS

IF3.6

2017-11-01

PREAI