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J

José Humberto Dias da Silva

Universidade Estadual Paulista
H指数:19
被引数:1,215

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Defect-induced Nb2O5 thin films via O2 flow interruption during RF magnetron sputtering: Tunable photoinduced charge transport

通过射频磁控溅射过程中O2气流中断制备的缺陷诱导Nb2O5薄膜：可调控的光诱导电荷传输

Journal of Alloys and Compounds
IF6.3
2026-05-120
OAAI
Lucas Caniati Escaliante; Luiz Felipe Kaezmarek Pedrini; Nilton Francelosi Azevedo Neto; Erick Pizarro Prestes; Lucas Prado Fonseca; Lucas Jorge Affonço; Kleper de Oliveira Rocha; Luis Vicente de Andrade Scalvi; Jose Humberto Dias da Silva
Amino Silane High Positive Charge Layers: A Stable and Durable Alternative Based on Electrostatic Interactions for Titanium Applications; Combining Antimicrobial and Biological Properties

氨基硅烷高正电荷层：一种基于静电相互作用适用于钛应用的稳定且耐用的替代方案；结合抗菌和生物特性

ACS Applied Bio Materials
IF4.7
2025-09-230
OAAI
João Pedro dos S. Silva; Mariana Mireski; Irene Mallor-Solís; Maria Helena Rossy Borges; Rodolfo Debone Piazza; Rodrigo Fernando Costa Marques; Nilson Cruz; Elidiane C. Rangel; Carlos A. Fortulan; José H. D. da Silva; Jean Geringer; Conrado Aparicio; Valentim A. R. Barão

研究方向

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N
Nilton Francelosi Azevedo Neto
H 指数:11论文数:49被引数:578
A
A. L. J. Pereira
H 指数:18论文数:70被引数:892
V
Valentim Adelino Ricardo Barão
H 指数:51论文数:314被引数:8,288
L
Lucas Caniati Escaliante
H 指数:6论文数:12被引数:66
P
Paulo Noronha Lisboa‐Filho
H 指数:33论文数:338被引数:4,312
L
Lucas J. Affonço
H 指数:7论文数:17被引数:185
E
Elidiane Cipriano Rangel
H 指数:33论文数:257被引数:3,726
A
Amanda Bandeira de Almeida
H 指数:10论文数:31被引数:485
F
Francisco Humberto Nociti
H 指数:62论文数:381被引数:1.2万
N
Nilson Cristino da Cruz
H 指数:34论文数:233被引数:3,739