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Alexander Efremov

nrc “kurchatov institute” – valiev ipt

26H指数
198论文数
2.4K被引数
收录论文 33
发表时间
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Comparative study of Ar- and He-rich SF6 + Ar + He plasmas for dry etching applications: Diagnostics and kinetic modelingAr-和He-富集SF6 + Ar + He等离子体在干法刻蚀应用中的比较研究：诊断与动力学建模
errVacuum
IF3.9
err2025-08-18
err0
PREAI
errAndrey Miakonkikh; Vitaly Kuzmenko; Alexander Efremov; Konstantin Rudenko
err分享
err收藏
On relationships between gas-phase and heterogeneous process kinetics in CF4+H2+Ar plasma
errVACUUM
IF3.9
err2025-04-01
err1
PREAI
errMiakonkikh, Andrey; Kuzmenko, Vitaly; Efremov, Alexander; Rudenko, Konstantin
err分享
err收藏
On mechanisms to control SiO2 etching kinetics in low-power reactive-ion etching process using CF4 + C4F8 + Ar + He plasma
errVACUUM
IF3.9
err2023-10-01
err6
PREAI
errChoi, Gilyoung; Efremov, Alexander; Lee, Dae-Kug; Cho, Choong-Ho; Kwon, Kwang-Ho
err分享
err收藏
On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF4, CHF3, and C4F8 Gases Mixed with Oxygen
errMATERIALS
IF3.2
err2023-07-17
err7
errOAAI
errBaek, Seung Yong; Efremov, Alexander; Bobylev, Alexander; Choi, Gilyoung; Kwon, Kwang-Ho
err分享
err收藏
Gas-phase parameters and densities of atomic species in Cl2 + O2 + Ar plasma: Effects of O2/Ar and Cl2/Ar mixing ratios
errVACUUM
IF3.9
err2023-01-01
err2
PREAI
errEfremov, Alexander; Amirov, Ildar; Izyumov, Mikhail
err分享
err收藏
On mechanisms influencing etching/polymerization balance in multi-component fluorocarbon gas mixtures
errVACUUM
IF3.9
err2022-12-01
err10
PREAI
errEfremov, Alexander; Son, Hye Jun; Choi, Gilyoung; Kwon, Kwang-Ho
err分享
err收藏
A comparison of CF4, CBrF3 and C2Br2F4 plasmas: Physical parameters and densities of atomic species
errVACUUM
IF3.9
err2022-06-01
err6
PREAI
errMiakonkikh, Andrey; Kuzmenko, Vitaly; Efremov, Alexander; Rudenko, Konstantin
err分享
err收藏
Comparative study of Cl2 + O2 and HBr + O2 plasma chemistries in respect to silicon reactive-ion etching process关于硅反应离子蚀刻工艺的Cl2 O2和HBr O2等离子体化学的比较研究
errVACUUM
IF3.9
err2021-04-01
err4
PREAI
errLim, Nomin; Efremov, Alexander; Kwon, Kwang-Ho
err分享
err收藏
Dry Etching Performance and Gas-Phase Parameters of C6F12O + Ar Plasma in Comparison with CF4 + Ar
errMATERIALS
IF3.2
err2021-03-24
err8
errOAAI
errLim, Nomin; Choi, Yeon Sik; Efremov, Alexander; Kwon, Kwang-Ho
err分享
err收藏
On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO2 and SixNy) in Multi-Component Fluorocarbon Gas Mixtures
errMATERIALS
IF3.2
err2021-03-15
err18
errOAAI
errEfremov, Alexander; Lee, Byung Jun; Kwon, Kwang-Ho
err分享
err收藏
Plasma Parameters and Etching Characteristics of SiOxNy Films in CF4 + O2 + X (X = C4F8 or CF2Br2) Gas Mixtures
errMATERIALS
IF3.2
err2020-12-01
err4
errOAAI
errNam, Yunho; Efremov, Alexander; Lee, Byung Jun; Kwon, Kwang-Ho
err分享
err收藏
Plasma parameters, gas-phase chemistry and Si/SiO2 etching mechanisms in HBr + Cl2 + O2 gas mixture: Effect of HBr/O2 mixing ratio
errVACUUM
IF3.9
err2019-05-01
err11
PREAI
errLee, Byung Jun; Efremov, Alexander; Kwon, Kwang-Ho
err分享
err收藏
On the relationships between plasma chemistry, etching kinetics and etching residues in CF4+C4F8+Ar and CF4+CH2F2+Ar plasmas with various CF4/C4F8 and CF4/CH2F2 mixing ratios
errVACUUM
IF3.9
err2018-02-01
err32
PREAI
errLee, Jaemin; Efremov, Alexander; Kwon, Kwang-Ho
err分享
err收藏
Etching Characteristics of Carbon Nanotube Thin Films in O2/Ar Plasma
errJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
IF0
err2016-11-01
err1
PREAI
errLee, Jaemin; Efremov, Alexander; Lee, Junmyung; Kim, Kwangsoo; Kwon, Kwang-Ho
err分享
err收藏
Degradation and modification of stainless-steel surface using Cl2/Ar inductively coupled plasmaCl2/Ar感应耦合等离子体对不锈钢表面的降解和改性
errAPPLIED SURFACE SCIENCE
IF6.9
err2013-08-01
err5
PREAI
errJang, Hanbyeol; Efremov, Alexander; Yun, Sun Jin; Yeom, Geun Young; Kim, Kyoung Bo; Kwon, Kwang-Ho
err分享
err收藏
Impact of the non-linear character of the compressive stress-strain curves on thermal and mechanical properties of porous microcracked ceramics
errJOURNAL OF THE EUROPEAN CERAMIC SOCIETY
IF6.2
err2013-02-01
err17
PREAI
errBruno, Giovanni; Kilali, Yassine; Efremov, Alexander M.
err分享
err收藏
Microstrain temperature evolution in β-eucryptite ceramics: Measurement and model
errACTA MATERIALIA
IF9.3
err2012-07-01
err28
PREAI
errBruno, G.; Garlea, V. O.; Muth, J.; Efremov, A. M.; Watkins, T. R.; Shyam, A.
err分享
err收藏
Connecting the macro and microstrain responses in technical porous ceramics. Part II: microcracking
errJOURNAL OF MATERIALS SCIENCE
IF3.9
err2012-01-07
err35
PREAI
errBruno, Giovanni; Efremov, Alexander M.; An, Chong P.; Wheaton, Bryan R.; Hughes, Darren J.
err分享
err收藏
Etching characteristics and mechanism of Ga-doped ZnO thin films in inductively-coupled HBr/X (X = Ar, He, N2, O2) plasmas
errVACUUM
IF3.9
err2011-04-01
err9
PREAI
errHam, Y. -H.; Efremov, A.; Lee, H. W.; Yun, S. J.; Min, N. K.; Baek, K. -H.; Do, L. -M.; Kwon, K. -H.
err分享
err收藏
Texture coefficients for the simulation of cordierite thermal expansion: A comparison of different approaches
errJOURNAL OF THE EUROPEAN CERAMIC SOCIETY
IF6.2
err2011-03-01
err16
PREAI
errEfremov, Alexander M.; Bruno, Giovanni; Wheaton, Bryan R.
err分享
err收藏

研究方向

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合作学者
合作期刊
B
B. Clausen
H 指数: 67 · 论文数: 422
D
Donald W. Brown
H 指数: 61 · 论文数: 572
J
John F. Muth
H 指数: 51 · 论文数: 283
G
Giovanni Bruno
H 指数: 40 · 论文数: 386
A
Amit Shyam
H 指数: 39 · 论文数: 168
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