未登录
分享
收藏
分享
收藏
分享
收藏The 2019 materials by design roadmap2019材料的设计路线图
Alberi, Kirstin; Nardelli, Marco Buongiorno; Zakutayev, Andriy; Mitas, Lubos; Curtarolo, Stefano; Jain, Anubhav; Fornari, Marco; Marzari, Nicola; Takeuchi, Ichiro; Green, Martin L.; Kanatzidis, Mercouri; Toney, Mike F.; Butenko, Sergiy; Meredig, Bryce; Lany, Stephan; Kattner, Ursula; Davydov, Albert; Toberer, Eric S.; Stevanovic, Vladan; Walsh, Aron; Park, Nam-Gyu; Aspuru-Guzik, Alan; Tabor, Daniel P.; Nelson, Jenny; Murphy, James; Setlur, Anant; Gregoire, John; Li, Hong; Xiao, Ruijuan; Ludwig, Alfred; Martin, Lane W.; Rappe, Andrew M.; Wei, Su-Huai; Perkins, John
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏Hafnium oxide films by atomic layer deposition for high-κ gate dielectric applications:: Analysis of the density of nanometer-thin films -: art. no. 073116
Puurunen, RL; Delabie, A; Van Elshocht, S; Caymax, M; Green, ML; Brijs, B; Richard, O; Bender, H; Conard, T; Hoflijk, I; Vandervorst, W; Hellin, D; Vanhaeren, D; Zhao, C; De Gendt, S; Heyns, M
分享
收藏Enhanced initial growth of atomic-layer-deposited metal oxides on hydrogen-terminated silicon
Frank, MM; Chabal, YJ; Green, ML; Delabie, A; Brijs, B; Wilk, GD; Ho, MY; da Rosa, EBO; Baumvol, IJR; Stedile, FC
分享
收藏
分享
收藏