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O

Oliver Bierwagen

paul-drude-institut für festkörperelektronik
H指数:40
被引数:5,846

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Effect of lithium diffusion into Ga2O3 thin films

锂扩散对Ga2O3薄膜的影响

Applied Surface Science
IF6.9
2025-07-040
OA
A. Sacchi; M. Sidoli; A. Ardenghi; O. Bierwagen; J. Kler; A. Falkenstein; R.A. De Souza; M. Martin; D. Spallek; J. Lähnemann; H. Tornatzky; M.R. Wagner; A. Parisini; M. Pavesi; M. Bosi; L. Seravalli; J.B. Varley; G. Spaggiari; D. Bersani; K. Mizohata; F. Tuomisto; G. Magnani; D. Pontiroli; M. Riccò; F. Mezzadri; S. Pasini; A. Bosio; R. Fornari; P. Mazzolini
Assessment of Trapping Phenomena in As-Grown and Thermally-Treated Si-Doped κ-Ga2O3 Layers via Optical Admittance Spectroscopy

通过光学导纳谱法对As-Grown和Thermally-Treated Si掺杂κ-Ga2O3层的俘获现象进行评估

Advanced Electronic Materials
IF5.3
2025-07-030
OAAI
Payam Rajabi Kalvani; Antonella Parisini; Maura Pavesi; Francesco Mattei; Piero Mazzolini; Kingsley Egbo; Oliver Bierwagen; Abderrahim Moumen; Salvatore Vantaggio; Samaneh Shapouri; Matteo Bosi; Luca Seravalli; Roberto Fornari
Engineering shallow and deep level defects in x-Ga 2 O 3 thin films: comparing metal-organic vapour phase epitaxy to molecular beam epitaxy and the effect of annealing treatments
MATERIALS TODAY PHYSICS
IF9.7
2024-06-012
OAAI
Mazzolini, P.; Varley, J. B.; Parisini, A.; Sacchi, A.; Pavesi, M.; Bosio, A.; Bosi, M.; Seravalli, L.; Janzen, B. M.; Marggraf, M. N.; Bernhardt, N.; Wagner, M. R.; Ardenghi, A.; Bierwagen, O.; Falkenstein, A.; Kler, J.; De Souza, R. A.; Martin, M.; Mezzadri, F.; Borelli, C.; Fornari, R.

研究方向

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P
Piero Mazzolini
H 指数:19论文数:78被引数:1,211
J
James S. Speck
H 指数:120论文数:1,476被引数:6.9万
A
Alexandra Papadogianni
H 指数:9论文数:23被引数:452
Z
Zbigniew Galazka
H 指数:48论文数:283被引数:1.0万
A
Andreas Falkenstein
H 指数:10论文数:28被引数:549
M
M. Albrecht
H 指数:68论文数:806被引数:1.7万
M
Markus R. Wagner
H 指数:40论文数:196被引数:5,734
P
Patrick Vogt
H 指数:19论文数:49被引数:1,551
M
Mark E. White
H 指数:26论文数:70被引数:1,623
G
Georg Hoffmann
H 指数:10论文数:28被引数:280