Jin-Goo Park - Publications, H-index & Citations

Jin-Goo Park

hanyang university erica

28H指数

282论文数

2.8K被引数

收录论文 51

发表时间

Role of acidic and alkaline cleaning solutions on ceria removal and brush-mediated cross-contamination during post-STI CMP cleaning 酸性和碱性清洁溶液在浅 trench 隔离后化学机械抛光清洁中对氧化铈去除及刷子介导的交叉污染的作用

Materials Science in Semiconductor Processing

IF4.6

2026-10-05

PREAI

Sumit Kumar; Jae-Hyeong Lee; Yeon Je Gye; Tae-Gon Kim; Jihoon Seo; Jin-Goo Park

Chemistry of selective metal ions adsorption and loading onto PVAc polymer brush during advanced metal post-CMP cleaning 选择性金属离子在PVAc聚合物刷上的吸附与负载在高级金属后CMP清洁中的化学机理

Applied Surface Science

IF6.9

2026-09-01

PREAI

Maheepal Yadav; Sanjay Bisht; Byung-Hyun Kim; Se-Hoon Park; Tae-Gon Kim; Jihoon Seo; Jin-Goo Park

Molybdenum Ion-Induced Adhesion of Colloidal Silica to Polyvinyl Acetal Brushes in Post-Chemical Mechanical Planarization Applications: Experiments and Multiscale Simulations 钼离子诱导的胶体二氧化硅在化学机械平坦化后处理应用中对聚乙烯缩醛刷的粘附：实验与多尺度模拟

ACS Applied Materials & Interfaces

IF0

2026-04-30

PREAI

Sumit Kumar; Palwasha Jalalzai; Tae-Gon Kim; Jihoon Seo; Junsang Lee; Gayoung Kim; In-Kwon Kim; Sangkyun Kim; Byung-Hyun Kim; Jin-Goo Park

Cobalt Ion Adsorption on Polyvinyl Acetal Brushes: Impact on Silica-Nanoparticle Loading During Metal Post-Chemical Mechanical Planarization Cleaning

ACS APPLIED NANO MATERIALS

IF5.5

2025-12-01

PREAI

Yadav, Maheepal; Bisht, Sanjay; Kim, Byung-Hyun; Hiyama, Hirokuni; Kim, Tae-Gon; Park, Jin-Goo

Polyethyleneimine polymer as an effective corrosion inhibitor for advanced node tungsten post-CMP cleaning 聚乙烯亚胺聚合物作为先进节点钨后化学机械抛光清洗的有效缓蚀剂

Applied Surface Science

IF6.9

2025-09-19

PREAI

Ranjith Punathil Meethal; Sumit Kumar; Maheepal Yadav; Palwasha Jalalzai; Andreas Klipp; Tae-Gon Kim; Jin-Goo Park

Effect of the additives on controlling ceria-brush chemical bonding during post-CMP cleaning

MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS

IF4.6

2025-07-01

PREAI

Sahir, Samrina; Han, Kwang-Min; Bisht, Sanjay; Kim, Tae-Gon; Park, Jin-Goo

Azoles as corrosion inhibitors in alkaline medium for ruthenium chemical mechanical planarization applications:Electrochemical and theoretical analysis

JOURNAL OF MOLECULAR STRUCTURE

IF4.7

2025-01-01

PREAI

Dhongde, Nikhil Rahul; Das, Nipu Kumar; Hazarika, Jenasree; Park, Jin-Goo; Banerjee, Tamal; Rajaraman, Prasanna Venkatesh

Benzethonium chloride as a tungsten corrosion inhibitor in neutral and alkaline media for the post-chemical mechanical planarization application 苄索氯铵作为中性和碱性介质中的钨腐蚀抑制剂，用于化学后机械平面化应用

JOURNAL OF COLLOID AND INTERFACE SCIENCE

IF9.7

2023-08-01

PREAI

Meethal, Ranjith Punathil; Jalalzai, Palwasha; Muskan; Kumar, Sumit; Peter, Jerome; Klipp, Andreas; Kim, Tae-Gon; Park, Jin-Goo

Effect of ammonium halide salts on wet chemical nanoscale etching and polishing of InGaAs surfaces for advanced CMOS devices

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

IF4.6

2023-07-01

PREAI

Samanta, Suprakash; Jin, Seungwan; Lee, Chan-Hee; Lee, Seong-Soo; Struyf, Herbert; Kim, Tae-Gon; Park, Jin-Goo

Effect of slurry particles on PVA brush contamination during post-CMP cleaning CMP后清洁过程中浆料颗粒对PVA刷污染的影响

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

IF4.6

2022-11-01

PREAI

Sahir, Samrina; Cho, Hwi-Won; Jalalzai, Palwasha; Samanta, Suprakash; Hamada, Satomi; Kim, Tae-Gon; Park, Jin-Goo

Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant 使用具有溶解气体和表面活性剂的溶液对图案化结构进行化学控制的兆声波清洁

ULTRASONICS SONOCHEMISTRY

IF9.7

2022-01-01

OAAI

Sahoo, Bichitra Nanda; Han, So Young; Kim, Hyun-Tae; Ando, Keita; Kim, Tae-Gon; Kang, Bong-Kyun; Klipp, Andreas; Yerriboina, Nagendra Prasad; Park, Jin-Goo

Investigation of the effect of different cleaning forces on Ce-O-Si bonding during oxide post-CMP cleaning CMP后氧化物清洗过程中不同清洗力对ce-o-si键合影响的研究

APPLIED SURFACE SCIENCE

IF6.9

2021-04-01

PREAI

Sahir, Samrina; Yerriboina, Nagendra Prasad; Han, So-Young; Han, Kwang-Min; Kim, Tae-Gon; Mahadev, Niraj; Park, Jin-Goo

Tungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizers

APPLIED SURFACE SCIENCE

IF6.9

2021-01-01

PREAI

Poddar, Maneesh Kumar; Jalalzai, Palwasha; Sahir, Samrina; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Park, Jin-Goo

Comparative evaluation of organic contamination sources from roller and pencil type PVA brushes during the Post-CMP cleaning process

POLYMER TESTING

IF6

2020-10-01

PREAI

Lee, Jung-Hwan; Poddar, Maneesh Kumar; Han, Kwang-Min; Ryu, Heon-Yul; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Wada, Yutaka; Hamada, Satomi; Hiyama, Hirokuni; Park, Jin-Goo

Nanocatalyst-induced hydroxyl radical (•OH) slurry for tungsten CMP for next-generation semiconductor processing

JOURNAL OF MATERIALS SCIENCE

IF3.9

2019-12-02

PREAI

Poddar, Maneesh Kumar; Ryu, Heon-Yul; Yerriboina, Nagendra Prasad; Jeong, Yeon-Ah; Lee, Jung-Hwan; Kim, Tae-Gon; Kim, Jae-Hyun; Park, Jong-Dai; Lee, Min-Gun; Park, Chang-Yong; Han, Seong-Jun; Choi, Jae-Gon; Park, Jin-Goo

Ultrasound-induced break-in method for an incoming polyvinyl acetal (PVA) brush used during post-CMP cleaning process CMP后清洁过程中使用的传入聚乙烯醇缩醛 (PVA) 刷的超声诱导的断裂方法

POLYMER TESTING

IF6

2019-09-01

PREAI

Lee, Jung-Hwan; Poddar, Maneesh Kumar; Yerriboina, Nagendra Prasad; Ryu, Heon-Yul; Han, Kwang-Min; Kim, Tae-Gon; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo

Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning

POLYMER TESTING

IF6

2019-08-01

PREAI

Lee, Jung-Hwan; Purushothaman, Muthukrishnan; Han, Kwang-Min; Ryu, Heon-Yul; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Wada, Yutaka; Hamada, Satomi; Hiyama, Hirokuni; Park, Jin-Goo

Fabrication of high performance copper-resin lapping plate for sapphire: A combined 2-body and 3-body diamond abrasive wear on sapphire

TRIBOLOGY INTERNATIONAL

IF6.9

2018-04-01

PREAI

Pyun, Hae-Jung; Purushothaman, Muthukrishnan; Cho, Byoung-Jun; Lee, Jung-Hwan; Park, Jin-Goo

Adsorption of sodium dodecyl sulfate on cleaning of an N-polar GaN surface in an alkaline solution

MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS

IF4.6

2017-08-01

PREAI

Kim, Min-Su; Paluvai, Nagarjuna Reddy; Kim, Hyun-Tae; Park, Jin-Goo