F. Roozeboom - Publications, H-index & Citations

F. Roozeboom

university of twente

48H指数

346论文数

8.2K被引数

收录论文 54

发表时间

Molecular layer deposited metalcone hybrid layers for solvent-resistant nanofiltration membranes: surface wetting and permeation 分子层沉积的金属锥杂化层用于溶剂抗性纳滤膜：表面润湿与渗透

Applied Surface Science Advances

IF8.7

2026-01-06

OAAI

Harpreet Sondhi; Tom Kramberg; Arian Nijmeijer; Fred Roozeboom; Serena Gabrielli; Mikhael Bechelany; Alexey Kovalgin; Mieke W.J. Luiten-Olieman

Influence of calcination temperature on the physicochemical properties of atomic/molecular layer deposited hybrid inorganic/organic ceramic nanofiltration membranes 煅烧温度对原子/分子层沉积的杂化无机/有机陶瓷纳滤膜物理化学性质的影响

OPEN CERAMICS

IF2.8

2025-06-01

OAAI

Nijboer, M. P.; Sondhi, H.; Makhoul, E.; Bechelany, M.; Gabrielli, S.; Roozeboom, F.; Nijmeijer, A.; Kovalgin, A. Y.; Luiten-Olieman, M. W. J.

Increasing hydrophobicity of ceramic membranes by post-deposition nitrogen annealing of molecular layer deposition grown hybrid layers 通过分子层沉积生长的混合层的沉积后氮退火来增加陶瓷膜的疏水性

APPLIED SURFACE SCIENCE

IF6.9

2025-02-01

OAAI

Sondhi, Harpreet; Nijboer, Michiel; Makhoul, Elissa; Nijmeijer, Arian; Roozeboom, Fred; Bechelany, Mikhael; Kovalgin, Alexey; Luiten-Olieman, Mieke

Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO2 and TiON on SiN vs SiO2 展开难以捉摸的区域选择性沉积过程: SiN与SiO2上的TiO2和TiON的原子层沉积

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2024-03-05

PREAI

Mameli, Alfredo; Tapily, Kanda; Shen, Jie; Roozeboom, Fred; Lu, Mengcheng; O'Meara, David; Semproni, Scott P.; Chen, Jiun-Ruey; Clark, Robert; Leusink, Gert; Clendenning, Scott

High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO2 with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low Defectivity 高通量区域选择性空间原子层沉积SiO2与交错的小分子抑制剂和集成的低缺陷率回蚀校正

ADVANCED MATERIALS

IF26.8

2023-04-28

OAAI

Karasulu, Bora; Roozeboom, Fred; Mameli, Alfredo

Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials

DALTON TRANSACTIONS

IF3.3

2023-01-01

OAAI

Chen, M.; Nijboer, M. P.; Kovalgin, A. Y.; Nijmeijer, A.; Roozeboom, F.; Luiten-Olieman, M. W. J.

Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2021-11-08

OAAI

Mione, M. A.; Vandalon, V.; Mameli, A.; Kessels, W. M. M.; Roozeboom, F.

Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3

APPLIED PHYSICS LETTERS

IF3.6

2019-08-21

OAAI

Mione, M. A.; Engeln, R.; Vandalon, V.; Kessels, W. M. M.; Roozeboom, F.

Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition

CHEMISTRY OF MATERIALS

IF7

2019-01-31

OAAI

Mameli, Alfredo; Karasulu, Bora; Verheijen, Marcel A.; Barcones, Beatriz; Macco, Bart; Mackus, Adriaan J. M.; Kessels, Wilhelmus M. M. Erwin; Roozeboom, Fred

Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma 使用乙酰丙酮和O2等离子体对ZnO进行各向同性原子层蚀刻

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2018-10-04

OAAI

Mameli, A.; Verheijen, M. A.; Mackus, A. J. M.; Kessels, W. M. M.; Roozeboom, F.

Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography

CHEMISTRY OF MATERIALS

IF7

2018-02-14

OAAI

Wu, Yizhi; Giddings, A. Devin; Verheijen, Marcel A.; Macco, Bart; Prosa, Ty J.; Larson, David J.; Roozeboom, Fred; Kessels, Wilhelmus M. M.

Anti-stiction coating for mechanically tunable photonic crystal devices 用于机械可调光子晶体器件的抗粘滞涂层

OPTICS EXPRESS

IF3.3

2018-02-06

OAAI

Petruzzella, M.; Zobenica, Z.; Cotrufo, M.; Zardetto, V.; Mameli, A.; Pagliano, F.; Koelling, S.; van Otten, F. W. M.; Roozeboom, F.; Kessels, W. M. M.; van der Heijden, R. W.; Fiore, A.

Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle 在ABC型循环中使用乙酰丙酮作为化学选择性抑制剂进行SiO2的区域选择性原子层沉积

ACS NANO

IF16

2017-09-07

201

OAAI

Mameli, Alfredo; Merkx, Marc J. M.; Karasulu, Bora; Roozeboom, Fred; Kessels, Wilhelmus (Erwin) M. M.; Mackus, Adriaan J. M.

Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation

CHEMISTRY OF MATERIALS

IF7

2017-01-31

OAAI

Mameli, Alfredo; Kuang, Yinghuan; Aghaee, Morteza; Ande, Chaitanya K.; Karasulu, Bora; Creatore, Mariadriana; Mackus, Adriaan J. M.; Kessels, Wilhelmus M. M.; Roozeboom, Fred

Atomic Layer Deposition of In2O3:H from InCp and H2O/O2: Microstructure and Isotope Labeling Studies

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2016-12-27

OAAI

Wu, Yizhi; Macco, Bart; Vanhemel, Dries; Kolling, Sebastian; Verheijen, Marcel A.; Koenraad, Paul M.; Kessels, Wilhelmus M. M.; Roozeboom, Fred

Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches

JOURNAL OF CHEMICAL PHYSICS

IF3.1

2016-12-20

PREAI

Erkens, I. J. M.; Verheijen, M. A.; Knoops, H. C. M.; Keuning, W.; Roozeboom, F.; Kessels, W. M. M.