Jacobus W. Swart - Publications, H-index & Citations

Jacobus W. Swart

universidade estadual de campinas

18H指数

255论文数

1.2K被引数

收录论文 14

发表时间

A Novel Microfluidics Droplet-Based Interdigitated Ring-Shaped Electrode Sensor for Lab-on-a-Chip Applications

MICROMACHINES

IF3

2024-05-22

OAAI

da Silva Junior, Salomao Moraes; Ribeiro, Luiz Eduardo Bento; Fruett, Fabiano; Stiens, Johan; Swart, Jacobus Willibrordus; Moshkalev, Stanislav

Synthesis of Submicron CaCO3 Particles in 3D-Printed Microfluidic Chips Supporting Advection and Diffusion Mixing

MICROMACHINES

IF3

2024-05-15

OAAI

Reznik, Ivan; Kolesova, Ekaterina; Pestereva, Anna; Baranov, Konstantin; Osin, Yury; Bogdanov, Kirill; Swart, Jacobus; Moshkalev, Stanislav; Orlova, Anna

Piezoresistive Sensor Based on Micrographite-Glass Thick Films 基于微石墨-玻璃厚膜的压阻传感器

SENSORS

IF3.5

2022-04-24

OAAI

Correa, Osvaldo; de Abreu Filho, Pompeu Pereira; Moshkalev, Stanislav; Swart, Jacobus

Electrooptic Modulation in Future All-Silicon Integrated Microwave Circuits: An Introduction of Gated MOSFET Devices With Increased Optical Emissions

IEEE MICROWAVE MAGAZINE

IF2.6

2022-04-01

PREAI

Yi, Bo; Li, Zepeng; Zhang, Zhengyuan; Xu, Kaikai; Snyman, Lukas W.; Swart, Jacobus W.

Light emission from a poly-silicon device with carrier injection engineering

MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS

IF4.6

2018-05-01

145

PREAI

Xu, Kaikai; Huang, Lei; Zhang, Zhengyuan; Zhao, Jianming; Zhang, Zhengping; Snyman, Lukas W.; Swart, Jacobus W.

Photodetection With Gate-Controlled Lateral BJTs from Standard CMOS Technology

IEEE SENSORS JOURNAL

IF4.5

2013-05-01

PREAI

Campos, Fernando de Souza; Faramarzpour, Naser; Marinov, Ognian; Deen, M. Jamal; Swart, Jacobus W.

Platinum thin films deposited on silicon oxide by focused ion beam: characterization and application

JOURNAL OF MATERIALS SCIENCE

IF3.9

2008-05-01

PREAI

Vaz, A. R.; da Silva, M. M.; Leon, J.; Moshkalev, S. A.; Swart, J. W.

Structural and surface properties of Si1-xGex thin films obtained by reduced pressure CVD

APPLIED SURFACE SCIENCE

IF6.9

2007-10-01

PREAI

Teixeira, R. C.; Doi, I.; Diniz, J. A.; Swart, J. W.; Zakia, M. B. P.

Fabrication and characterization of Ge nanocrystalline growth by ion implantation in SiO2 matrix

JOURNAL OF MATERIALS SCIENCE

IF3.9

2007-09-01

PREAI

Mestanza, S. N. M.; Doi, I.; Swart, J. W.; Frateschi, N. C.

Development of process for far infrared sensor fabrication

SENSORS AND ACTUATORS A-PHYSICAL

IF4.9

2006-11-01

PREAI

Neli, Roberto R.; Doi, Ioshiaki; Diniz, Jose A.; Swart, Jacobus W.

IonRock: software for solving strain gradients of ion-implanted semiconductors by X-ray diffraction measurements and evolutionary programming

COMPUTER PHYSICS COMMUNICATIONS

IF3.4

2004-07-01

PREAI

Bleicher, L; Sasaki, JM; Orloski, RV; Cardoso, LP; Hayashi, MA; Swart, JW

Silicon nitride deposited by ECR-CVD at room temperature for LOCOS isolation technology

APPLIED SURFACE SCIENCE

IF6.9

2003-05-01

PREAI

Pereira, MA; Diniz, JA; Doi, I; Swart, JW

Insulators obtained by electron cyclotron resonance plasmas on Si or GaAs

MATERIALS CHARACTERIZATION

IF5.5

2003-03-01

PREAI

Diniz, JA; Doi, I; Swart, JW

Study of conditions for anisotropic plasma etching of tungsten and tungsten nitride using SF6/Ar gas mixtures

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2002-01-01

PREAI

Reyes-Betanzo, C; Moshkalyov, SA; Ramos, AC; Diniz, JA; Swart, JW

研究方向