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S

S. Berg

uppsala university

40H指数
370论文数
5.1K被引数
收录论文 21
发表时间
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Diet and food selection by fish larvae in turbid and clear water shallow temperate lakes
errSCIENCE OF THE TOTAL ENVIRONMENT
IF8
err2022-01-01
err6
errOAAI
errTrochine, Carolina; Risholt, Casper; Schou, Majbritt O.; Lauridsen, Torben L.; Jacobsen, Lene; Skov, Christian; Sondergaard, Martin; Berg, Soren; Christoffersen, Kirsten S.; Jeppesen, Erik
err分享
err收藏
The ten steps to responsible Inland fisheries in practice: reflections from diverse regional case studies around the globe负责任的内陆渔业实践的十个步骤: 来自全球不同区域案例研究的思考
errREVIEWS IN FISH BIOLOGY AND FISHERIES
IF4.6
err2021-07-15
err14
PREAI
errCooke, Steven J.; Nyboer, Elizabeth; Bennett, Abigail; Lynch, Abigail J.; Infante, Dana M.; Cowx, Ian G.; Beard, T. Douglas, Jr.; Bartley, Devin; Paukert, Craig P.; Reid, Andrea J.; Funge-Smith, Simon; Gondwe, Edith; Kaunda, Emmanuel; Koehn, John D.; Souter, Nicholas J.; Stokes, Gretchen L.; Castello, Leandro; Leonard, Nancy J.; Skov, Christian; Berg, Soren; Taylor, William W.
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Applying the upgraded Berg model to predict hysteresis free reactive sputtering
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2016-03-01
err4
PREAI
errSarhammar, E.; Nyberg, T.; Berg, S.
err分享
err收藏
Applying the upgraded Berg model to predict hysteresis free reactive sputtering
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2015-10-01
err19
PREAI
errSarhammar, E.; Nyberg, T.; Berg, S.
err分享
err收藏
FTIR analysis of a-SiCN:H films deposited by PECVD
errVACUUM
IF3.9
err2013-12-01
err54
PREAI
errPeter, S.; Bernuetz, S.; Berg, S.; Richter, F.
err分享
err收藏
A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2013-10-01
err36
PREAI
errSarhammar, E.; Strijckmans, K.; Nyberg, T.; Van Steenberge, S.; Berg, S.; Depla, D.
err分享
err收藏
Mid-frequency PECVD of a-SiCN:H films and their structural, mechanical and electrical properties
errVACUUM
IF3.9
err2013-04-01
err29
PREAI
errPeter, S.; Guenther, M.; Berg, S.; Clausner, A.; Richter, F.
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err收藏
Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2012-08-01
err12
PREAI
errKubart, T.; Schmidt, R. M.; Austgen, M.; Nyberg, T.; Pflug, A.; Siemers, M.; Wuttig, M.; Berg, S.
err分享
err收藏
Sputter yield amplification by tungsten doping of Al2O3 employing reactive serial co-sputtering: process characteristics and resulting film properties
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2011-08-10
err12
errOAAI
errAustgen, M.; Koehl, D.; Zalden, P.; Kubart, T.; Nyberg, T.; Pflug, A.; Siemers, M.; Berg, S.; Wuttig, M.
err分享
err收藏
Reactive sputtering of SiO2-TiO2 thin film from composite Six/TiO2 targets
errVACUUM
IF3.9
err2010-08-01
err8
PREAI
errLiljeholm, L.; Nyberg, T.; Kubart, T.; Roos, A.; Berg, S.
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err收藏
Modelling of sputtering yield amplification effect in reactive deposition of oxides氧化物反应沉积中溅射产率放大效应的建模
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2010-08-01
err16
PREAI
errKubart, T.; Nyberg, T.; Pflug, A.; Siemers, M.; Austgen, M.; Koehl, D.; Wuttig, M.; Berg, S.
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err收藏
Modelling of low energy ion sputtering from oxide surfaces
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2010-05-06
err38
errOAAI
errKubart, T.; Nyberg, T.; Berg, S.
err分享
err收藏
High rate reactive magnetron sputter deposition of titanium oxide
errAPPLIED PHYSICS LETTERS
IF3.6
err2008-06-02
err51
PREAI
errKubart, T.; Depla, D.; Martin, D. M.; Nyberg, T.; Berg, S.
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err收藏
Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides
errAPPLIED PHYSICS LETTERS
IF3.6
err2006-04-21
err52
PREAI
errSeverin, D; Kappertz, O; Kubart, T; Nyberg, T; Berg, S; Pflug, A; Siemers, M; Wuttig, M
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Eliminating the hysteresis effect for reactive sputtering processes
errAPPLIED PHYSICS LETTERS
IF3.6
err2005-04-15
err52
PREAI
errNyberg, T; Berg, S; Helmersson, U; Hartig, K
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err收藏
Ion assisted deposition of Zn-Mg coatings by unbalanced magnetron sputtering
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err1999-09-01
err8
PREAI
errShedden, BA; Katardjiev, IV; Berg, S; Samandi, M; Window, B
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Thin film processing by radio frequency hollow cathodes射频空心阴极薄膜加工
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err1997-12-01
err32
PREAI
errBardos, L; Barankova, H; Berg, S
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err收藏
The influence of the deposition angle on the composition of reactively sputtered thin films沉积角度对反应溅射薄膜组成的影响
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err1997-10-01
err7
PREAI
errNyberg, T; Nender, C; Hogberg, H; Berg, S
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err收藏
Characterization of the linear arc discharge (LAD) source for film deposition
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err1997-10-01
err4
PREAI
errBarankova, H; Bardos, L; Berg, S
err分享
err收藏
Resputtering effects during ion beam assisted deposition and the sputter yield amplification effect
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err1996-10-01
err23
PREAI
errBerg, S; Katardjiev, I
err分享
err收藏

研究方向

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合作学者
合作期刊
E
Erik Jeppesen
H 指数: 127 · 论文数: 1.0K
S
Steven J. Cooke
H 指数: 125 · 论文数: 1.6K
M
Matthias Wuttig
H 指数: 97 · 论文数: 730
M
Martin Søndergaard
H 指数: 90 · 论文数: 501
I
I. G. Cowx
H 指数: 69 · 论文数: 325
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