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收藏Modeling of material removal rate considering the chemical mechanical effects of lubricant, oxidant, and abrasive particles for aluminum chemical mechanical polishing at low pressure考虑润滑剂,氧化剂和磨料颗粒的化学机械效应的材料去除率建模,用于低压下的铝化学机械抛光
Xia, Guang; Wang, Zirui; Yao, Qingyu; Sun, Ping; Guan, Huaijun; Wang, Yongguang; Fan, Cheng; Bian, Da; Zhao, Dong; Zhao, Yongwu
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