Harald Bosse - Publications, H-index & Citations

Harald Bosse

physikalisch-technische bundesanstalt

25H指数

136论文数

2.3K被引数

收录论文 19

发表时间

Photomask linewidth measurement comparison including an improved model-based through-focus measurement approach 光刻掩模线宽测量比较，包括改进的基于模型的透焦测量方法

Measurement Science and Technology

IF3.4

2026-03-06

OAAI

Jan Krüger; Sven Dopslaff; Phillip Manley; Detlef Bergmann; Rainer Köning; Gaoliang Dai; Kai Hahm; Philipp-Immanuel Schneider; Martin Hammerschmidt; Lin Zschiedrich; Harald Bosse; Bernd Bodermann

Announcing the 2024 Measurement Science and Technology outstanding paper awards 宣布2024年测量科学与技术杰出论文奖

MEASUREMENT SCIENCE AND TECHNOLOGY

IF3.4

2025-09-30

PREAI

Yoo, Hongki; Discetti, Stefano; Bosse, Harald; Jakoby, Bernhard; Laflamme, Simon

Dimensional metrology based on ultrashort pulse laser and optical frequency comb 基于超短脉冲激光和光学频率梳的尺寸测量技术

CIRP Annals

IF0

2025-06-13

OAAI

W. Gao; S.W. Kim; H. Bosse; K. Minoshima

A GPS-Referenced Wavelength Standard for High-Precision Displacement Interferometry at λ=633 nm

SENSORS

IF3.5

2023-02-03

OAAI

Blumroeder, Ulrike; Koechert, Paul; Froehlich, Thomas; Kissinger, Thomas; Ortlepp, Ingo; Fluegge, Jens; Bosse, Harald; Manske, Eberhard

Advances in the metrological traceability and performance of X-ray computed tomography X射线计算机断层扫描的计量溯源和性能研究进展

CIRP ANNALS-MANUFACTURING TECHNOLOGY

IF3.6

2022-01-01

OAAI

Dewulf, Wim; Bosse, Harald; Carmignato, Simone; Leach, Richard

Sampling and Mass Detection of a Countable Number of Microparticles Using on-Cantilever Imprinting

SENSORS

IF3.5

2020-04-28

OAAI

Nyang'au, Wilson Ombati; Setiono, Andi; Schmidt, Angelika; Bosse, Harald; Peiner, Erwin

Dimensional artefacts to achieve metrological traceability in advanced manufacturing

CIRP ANNALS-MANUFACTURING TECHNOLOGY

IF3.6

2020-01-01

OAAI

Carmignato, S.; De Chiffre, L.; Bosse, H.; Leach, R. K.; Balsamo, A.; Estler, W. T.

Cantilever-Droplet-Based Sensing of Magnetic Particle Concentrations in Liquids

SENSORS

IF3.5

2019-11-01

OAAI

Nyang'au, Wilson Ombati; Setiono, Andi; Bertke, Maik; Bosse, Harald; Peiner, Erwin

Using DNA origami nanorulers as traceable distance measurement standards and nanoscopic benchmark structures

SCIENTIFIC REPORTS

IF3.9

2018-01-29

OAAI

Raab, Mario; Jusuk, Ija; Molle, Julia; Buhr, Egbert; Bodermann, Bernd; Bergmann, Detlef; Bosse, Harald; Tinnefeld, Philip

Contributions of precision engineering to the revision of the SI

CIRP ANNALS-MANUFACTURING TECHNOLOGY

IF3.6

2017-01-01

OAAI

Bosse, Harald; Kunzmann, Horst; Pratt, Jon R.; Schlamminger, Stephan; Robinson, Ian; de Podesta, Michael; Shore, Paul; Balsamo, Alessandro; Morantz, Paul

Implementation of straightness measurements at the Nanometer Comparator 在纳米比较器上实现直线度测量

CIRP ANNALS-MANUFACTURING TECHNOLOGY

IF3.6

2016-01-01

PREAI

Weichert, Christoph; Bosse, Harald; Fluegge, Jens; Koening, Rainer; Koechert, Paul; Wiegmann, Axel; Kunzmann, Horst

New frontiers in angle metrology at the PTB

MEASUREMENT

IF5.6

2015-09-01

PREAI

Geckeler, Ralf D.; Krause, Michael; Just, Andreas; Kranz, Oliver; Bosse, Harald

Measurement technologies for precision positioning

CIRP ANNALS-MANUFACTURING TECHNOLOGY

IF3.6

2015-01-01

467

PREAI

Gao, W.; Kim, S. W.; Bosse, H.; Haitjema, H.; Chena, Y. L.; Lu, X. D.; Knapp, W.; Weckenmann, A.; Estler, W. T.; Kunzmann, H.

Heterodyne multi-wavelength absolute interferometry based on a cavity-enhanced electro-optic frequency comb pair

OPTICS LETTERS

IF3.3

2014-10-07

PREAI

Yang, Ruitao; Pollinger, Florian; Meiners-Hagen, Karl; Tan, Jiubin; Bosse, Harald

Quantitative analysis of nano-wear on DLC coatings by AFM

CIRP ANNALS-MANUFACTURING TECHNOLOGY

IF3.6

2013-01-01

PREAI

Dai, Gaoliang; Pohlenz, Frank; Felgner, Andre; Bosse, Harald; Kunzmann, Horst

Comparison of angle standards with the aid of a high-resolution angle encoder

PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY

IF3.7

2009-10-01

PREAI

Just, A.; Krause, M.; Probst, R.; Bosse, H.; Haunerdinger, H.; Spaeth, Ch.; Metz, G.; Israel, W.

Model-based SEM for dimensional metrology tasks in semiconductor and mask industry

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2009-09-02

PREAI

Frase, C. G.; Gnieser, D.; Bosse, H.

An international length comparison using vacuum comparators and a photoelectric incremental encoder as transfer standard

PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY

IF3.7

2008-01-01

PREAI

Tiemann, I.; Spaeth, C.; Wallner, G.; Metz, G.; Israel, W.; Yamaryo, Y.; Shimomura, T.; Kubo, T.; Wakasa, T.; Morosawa, T.; Koening, R.; Fluegge, J.; Bosse, H.

Electron permeable membranes for MEMS electron sources

SENSORS AND ACTUATORS A-PHYSICAL

IF4.9

2006-11-01

PREAI

Haase, F.; Detemple, P.; Schmitt, S.; Lendle, A.; Haverbeck, O.; Doll, T.; Gnieser, D.; Bosse, H.; Frase, G.

研究方向