A. Goullet - Publications, H-index & Citations

A. Goullet

centre national de la recherche scientifique (cnrs)

25H指数

130论文数

1.8K被引数

收录论文 28

发表时间

Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization

LANGMUIR

IF3.9

2024-02-04

PREAI

Chouteau, S.; Stafford, L.; Granier, A.; Goullet, A.; Richard-Plouet, M.

Kinetics driving nanocomposite thin-film deposition in low-pressure misty plasma processes

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2022-11-08

OAAI

Chouteau, S.; Mitronika, M.; Goullet, A.; Richard-Plouet, M.; Stafford, L.; Granier, A.

Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2021-08-31

OAAI

Ravisy, W.; Richard-Plouet, M.; Dey, B.; Bulou, S.; Choquet, P.; Granier, A.; Goullet, A.

TiO2-SiO2 mixed oxide deposited by low pressure PECVD: Insights on optical and nanoscale electrical properties

APPLIED SURFACE SCIENCE

IF6.9

2021-03-01

OAAI

Mitronika, M.; Villeneuve-Faure, C.; Massol, F.; Boudou, L.; Ravisy, W.; Besland, M. P.; Goullet, A.; Richard-Plouet, M.

Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source

SCIENTIFIC REPORTS

IF3.9

2020-12-15

OAAI

Dey, B.; Bulou, S.; Gaulain, T.; Ravisy, W.; Richard-Plouet, M.; Goullet, A.; Granier, A.; Choquet, P.

TiO2-SiO2 nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O2/HMDSO low-pressure plasma

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2020-12-15

OAAI

Mitronika, Maria; Profili, Jacopo; Goullet, Antoine; Gautier, Nicolas; Stephant, Nicolas; Stafford, Luc; Granier, Agnes; Richard-Plouet, Mireille

Unravelling local environments in mixed TiO2-SiO2 thin films by XPS and ab initio calculations 通过XPS和从头算来解开混合TiO2-SiO2薄膜中的局部环境

APPLIED SURFACE SCIENCE

IF6.9

2020-04-01

OAAI

Ondracka, Pavel; Necas, David; Carette, Michele; Elisabeth, Stephane; Holec, David; Granier, Agnes; Goullet, Antoine; Zajickova, Lenka; Richard-Plouet, Mireille

TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD

APPLIED SURFACE SCIENCE

IF6.9

2019-10-01

OAAI

Li, D.; Gautier, N.; Dey, B.; Bulou, S.; Richard-Plouet, M.; Ravisy, W.; Goullet, A.; Choquet, P.; Granier, A.

Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD

APPLIED SURFACE SCIENCE

IF6.9

2019-02-01

OAAI

Li, D.; Bulou, S.; Gautier, N.; Elisabeth, S.; Goullet, A.; Richard-Plouet, M.; Choquet, P.; Granier, A.

Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering

APPLIED SURFACE SCIENCE

IF6.9

2018-06-01

PREAI

Bachar, A.; Bousquet, A.; Mehdi, H.; Monier, G.; Robert-Goumet, C.; Thomas, L.; Belmahi, M.; Goullet, A.; Sauvage, T.; Tomasella, E.

Nitrogen doping on NiO by reactive magnetron sputtering: A new pathway to dynamically tune the optical and electrical properties

APPLIED SURFACE SCIENCE

IF6.9

2017-07-01

PREAI

Keraudy, Julien; Ferrec, Axel; Richard-Plouet, Mireille; Hamon, Jonathan; Goullet, Antoine; Jouan, Pierre-Yves

Optical properties of TixSi1-xO2 solid solutions

PHYSICAL REVIEW B

IF3.7

2017-05-30

PREAI

Ondracka, Pavel; Holec, David; Necas, David; Kedronova, Eva; Elisabeth, Stephane; Goullet, Antoine; Zajickova, Lenka

Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor

VACUUM

IF3.9

2016-09-01

PREAI

Li, D.; Goullet, A.; Carette, M.; Granier, A.; Zhang, Y.; Landesman, J. P.

Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering

APPLIED SURFACE SCIENCE

IF6.9

2015-12-01

PREAI

Keraudy, J.; Molleja, J. Garcia; Ferrec, A.; Corraze, B.; Richard-Plouet, M.; Goullet, A.; Jouan, P. -Y.

Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS

SURFACE & COATINGS TECHNOLOGY

IF6.1

2014-07-01

PREAI

Nguyen, D. T.; Ferrec, A.; Keraudy, J.; Richard-Plouet, M.; Goullet, A.; Cattin, L.; Brohan, L.; Jouan, P. -Y.

In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition

APPLIED SURFACE SCIENCE

IF6.9

2013-10-01

PREAI

Li, D.; Carette, M.; Granier, A.; Landesman, J. P.; Goullet, A.

Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2013-01-14

OAAI

Rouahi, A.; Kahouli, A.; Challali, F.; Besland, M. P.; Vallee, C.; Yangui, B.; Salimy, S.; Goullet, A.; Sylvestre, A.

Influence of synthesis conditions on optical and electrical properties of CaTiO3:Pr3+ thin films deposited by radiofrequency sputtering for electroluminescent device

SURFACE & COATINGS TECHNOLOGY

IF6.1

2011-07-01

PREAI

Sarakha, Ludovic; Begou, Thomas; Goullet, Antoine; Cellier, J.; Bousquet, Angelique; Tomasella, E.; Sauvage, T.; Boutinaud, Philippe; Mahiou, Rachid

First developments for photonics integrated on plasma-polymer-HMDSO:: Single-mode TE00-TM00 straight waveguides 集成在等离子体-聚合物-HMDSO上的光子学的首次发展:: 单模TE00-TM00直波导

OPTICAL MATERIALS

IF4.2

2007-12-01

PREAI

Begou, T.; Beche, B.; Goullet, A.; Landesman, J. P.; Granier, A.; Cardinaud, C.; Gaviot, E.; Camberlein, L.; Grossard, N.; Jezequel, G.; Zyss, J.

Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas

SURFACE & COATINGS TECHNOLOGY

IF6.1

2006-06-01

PREAI

Bousquet, A.; Bursikova, V.; Goullet, A.; Djouadi, A.; Zajickova, L.; Granier, A.

研究方向