未登录

H

Hyeongtag Jeon

hanyang university

H指数:39

被引数:5,543

个人简介

暂无内容

教育背景

暂无内容

工作经历

暂无内容

荣誉奖项

暂无内容

Enhancing electrical characteristics of ALD-deposited SnO2 thin-film transistors via controlling ozone concentration and Al supercycle doping

通过控制臭氧浓度和Al超周期掺杂来增强原子层沉积SnO2薄膜晶体管的电学特性

Surfaces and Interfaces

IF6.3

2026-08-010

PRE

DC-biased PEALD and post-annealing for highly crystalline HfOx thin films

直流偏压原子层沉积及后续退火制备高结晶度HfOx薄膜

Journal of Alloys and Compounds

IF6.3

2026-05-110

PRE

In2O3 seed layer-assisted growth of cubic SnS thin films using atomic layer deposition

采用原子层沉积法制备的In2O3种子层辅助生长立方相SnS薄膜

Journal of Alloys and Compounds

IF6.3

2025-07-240

PRE

Effect of precursor Pre-Treatment of tin monosulfide thin film using atomic layer deposition

采用原子层沉积法对一硫化锡薄膜前驱体进行预处理的效应

APPLIED SURFACE SCIENCE

IF6.9

2025-05-230

PRE

Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films Using Ultralow Electron Temperature Plasma

利用超低电子温度等离子体增强原子层沉积法制备TiN薄膜

ACS APPLIED MATERIALS & INTERFACES

IF0

2025-02-071

PRE

Atomic layer deposition of tin monosulfide thin film using Sn(acac)2 and H2S

IF3.9

2025-01-011

PRE

Wafer-scale growth of 2D SnSx hybrid films on germanium by atomic layer deposition for broadband photodetection

APPLIED SURFACE SCIENCE

IF6.9

2024-11-010

PRE

Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water) (vol 857, 157931, 2021)

JOURNAL OF ALLOYS AND COMPOUNDS

IF6.3

2023-01-010

PRE

Study of Metal-Dielectric Interface for Improving Electrical Properties and Reliability of DRAM Capacitor

金属-介质界面改善DRAM电容器电性能和可靠性的研究

ADVANCED MATERIALS TECHNOLOGIES

IF6.2

2022-07-108

PRE

The effect of O2 plasma post-treatment on atomic layer deposited TiO2 thin films

O2等离子体后处理对原子层沉积TiO2薄膜的影响

IF3.9

2022-05-0115

PRE

Deposition of the tin sulfide thin films using ALD and a vacuum annealing process for tuning the phase transition

使用ALD和真空退火工艺沉积硫化锡薄膜以调节相变

JOURNAL OF ALLOYS AND COMPOUNDS

IF6.3

2022-03-0121

PRE

SnS-functionalized SnO2 nanowires for low-temperature detection of NO2 gas

用于NO2气体低温检测的SnS功能化SnO2纳米线

MATERIALS CHARACTERIZATION

IF5.5

2021-05-0121

PREAI

New approach to SnO2-based transparent conducting oxides incorporating synergistic effects of Au nano particles and microwave irradiation

CERAMICS INTERNATIONAL

IF5.6

2021-04-017

PREAI

Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N2 plasma

APPLIED SURFACE SCIENCE

IF6.9

2021-03-0122

PREAI

Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)

JOURNAL OF ALLOYS AND COMPOUNDS

IF6.3

2021-03-0113

PREAI

Exploration of ZrO 2-shelled nanowires for chemiresistive detection of NO 2 gas

SENSORS AND ACTUATORS B-CHEMICAL

IF7.7

2020-09-0121

PREAI

Effect of single Al2O3 cycle insertion with various positions in SnO2 thin films using atomic layer deposition

CERAMICS INTERNATIONAL

IF5.6

2020-06-0111

PREAI

Atomic layer deposition growth of SnS2 films on diluted buffered oxide etchant solution-treated substrate

APPLIED SURFACE SCIENCE

IF6.9

2019-12-0114

PREAI

Effect of microwave irradiation on the electrical and optical properties of SnO2 thin films

CERAMICS INTERNATIONAL

IF5.6

2019-04-0134

PREAI

Synthesis, Characterization and Gas-Sensing Properties of Pristine and SnS2 Functionalized TeO2 Nanowires

METALS AND MATERIALS INTERNATIONAL

IF4

2018-12-1216

PREAI