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2D Memory Enabled by Electrical Stimulation-Induced Defect Engineering for Complicated Neuromorphic Computing

delete2024-11-18
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PRE
AI
J
Jie Cheng
P
Pan Zhang
X
Xinyu Ouyang
W
Weijia Tang
B
Bing Song
Y
Youwei Zhang *
Y
Yu Zheng *
潘安练 封面图
潘安练 (Anlian Pan) *
DOI:10.1002/adfm.202416333delete
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摘要

摘要

En 中文
Defect engineering is extensively utilized in 2D memory devices due to its effectiveness in enhancing charge-trapping ability. However, conventional defect modulation techniques usually introduce only single types of carrier traps and cannot reconfigure trap types and densities after device fabrication. Here, for the first time, electrical stimulation-driven long-range migration of Cu ions within CuInP2S6 (CIPS) films is demonstrated to simultaneously introduce both electron and hole traps and enable reconfigurable modulation of interfacial defect trapping. This process is referred to as electrical stimulation-induced defect engineering. By integrating these defect traps and the dual-gate coupling effect, the memory window-to-scan range (MW/S.R) ratio, which reflects the device's charge trapping ability, doubled and peaked at 78.1% at Vbg = +/- 80 V. Additionally, the dual-gate memory device based on the graphene/CIPS/h-BN/WSe2 heterostructure exhibits a maximum on/off ratio reaching 107 for multi-level storage states, integrating neuromorphic computing and logic operations within a single platform. With 81 storage states and paired-pulse facilitation (PPF), it achieves approximate to 90% accuracy in reservoir computing (RC) simulations. These results highlight the potential of electrical stimulation-induced defect engineering for next-generation electronics.
Keyword:
charge-trapping
CuInP2S6
defect engineering
dual-gate coupling effect
neuromorphic computing
nonvolatile storage

期刊

Advanced Functional Materials 封面图
Advanced Functional Materials
IF:
19
论文数:
3.5W
被引数:
32.1W

机构

C
Central South University
学者数:
10.0W
论文数: 7.2W
被引数: 10.9W
P
peking university
学者数:
11.9W
论文数: 8.7W
被引数: 146
H
hunan university
学者数:
4.5W
论文数: 3.3W
被引数: 70
N
national university of defense technology - china
学者数:
1.8W
论文数: 1.4W
被引数: 9
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