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Deriving optimal atomic layer deposition process conditions using machine learning

delete2025-05-28
delete0
PRE
AI
J
Jangwon Seo
H
Hyo-Seok Hwang
S
Sun-Young Park
S
Seungmin Lee
D
Dae Sin Kim
S
Sun-Taek Lim
J
Junhee Seok *
DOI：10.1016/j.jii.2025.100879delete
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摘要

摘要

En 中文
• 引入了结合MLP和GPR的ALD-GPR模型以预测分压。 • 实现了RMSE为0.0074且速度提升18倍，证明ALD-GPR可作为CFD的替代方案。 • 开发了用于评估均匀性并推导最优ALD工艺条件的指标。 • 提供了一个基于数据的框架以提升ALD工艺的效率与均匀性。

期刊

Journal of Industrial Information Integration 封面图
Journal of Industrial Information Integration
IF:
11.6
论文数:
906
被引数:
4.4K

机构

S
semiconductor r&d center
学者数:
54
论文数: 18
被引数: 0
K
Korea University
学者数:
3.6W
论文数: 3.8W
被引数: 4.4W
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