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Semiconductor R&D Center

学者数54
论文数18
被引数0
关联论文 (14)
发表时间
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Influence of Gate Dielectric and Channel Scaling on the Low-Frequency Noise Characteristics of InGaZnO Field-Effect Transistors
errACS Applied Electronic Materials
IF4.7
err2026-02-04
err0
PREAI
errTaegyu Kim; Youngjin Kang; San Nam; Hyunhee Kim; Sangyeon Kim; Je-Jun Lee; Eungseon Yeon; Jung Pyo Hong; Tae-Yon Lee; Do Kyung Hwang; Yong-Hoon Kim
err分享
err收藏
Keggin-Type Aluminum Polyoxometalate-Mediated Oxidation of Amorphous Carbon for Engineered Electrochemical InterfacesKeggin型铝多金属氧酸盐介导的无定形碳氧化用于构建工程电化学界面
errCarbon Energy
IF24.2
err2025-11-29
err0
errOAAI
errGanggyu Lee; Dongmin Kang; Sumin Hong; Hongjun Park; Myungju Woo; Woojin Jeong; Giha Lee; Junsang Lee; Sangkyun Kim; Jea-Gun Park; Takamasa Mori; Yehwan Kim; Taeseup Song; Ungyu Paik
err分享
err收藏
Tin-Oxo Nanocluster Extreme UV Photoresists Equipped with Chemical Features for Atmospheric Stability and High EUV Sensitivity锡-氧纳米簇极紫外光刻胶，具有提高大气稳定性和高EUV灵敏度的化学特性
errAdvanced Functional Materials
IF19
err2025-11-26
err0
PREAI
errYejin Ku; Gayoung Kim; Minseung Kim; Hyungju Ahn; Jin-Kyun Lee; Jiho Kim; Byeong-Gyu Park; Dohyun Moon; Sangsul Lee; Seohyeon Lee; Yu Ha Jang; Byung Jun Jung; Hyunseok Kim; Changhyeon Lee; Su-Mi Hur; Ji Young Park; Chawon Koh; Tsunehiro Nishi; Hyun-Woo Kim
err分享
err收藏
High-Mobility IZO Thin-Film Transistors Enabled by Precise Hydrogen Control Using a SiO2–Al2O3 Supercycle via Plasma-Enhanced Atomic Layer Deposition通过等离子体增强原子层沉积技术利用SiO2–Al2O3超循环精确控制氢元素实现高迁移率IZO薄膜晶体管
errACS Applied Materials & Interfaces
IF8.2
err2025-11-25
err0
PREAI
errSunghwan Park; Seong-In Cho; Hwa Young Kim; Sang-Hee Ko Park; Jong Beom Ko
err分享
err收藏
An efficient multiscale coupling method for simulations of reactor-scale chemical vapor deposition with microstructural features一种用于具有微观结构特征的反应器尺度化学气相沉积模拟的高效多尺度耦合方法
errAdvances in Engineering Software
IF5.7
err2025-10-30
err0
PREAI
errTaegeun Kim; Hyoungsoo Ko; Jaewon Jang; Sejin Kim; Sunyoung Park; Jae Myung Choe; Young-gu Kim; Dae Sin Kim; Sangseung Lee; Donghyun You
err分享
err收藏
Anderson’s negative-U chemistry in amorphous silicon nitride: A complex system approachAnderson的负U化学在非晶硅 nitride 中：一种复杂系统方法
errScience Advances
IF12.5
err2025-10-24
err0
PREAI
errWoon Ih Choi; Bokyeom Kim; Uihui Kwon; Yong-Hee Cho; Won-Joon Son; Hawoong Jeong; Richard Dronskowski; Dae Sin Kim
err分享
err收藏
Atomic-scale analysis of long-term degraded zeolite 13X长期降解的沸石13X的原子级分析
errJournal of the American Ceramic Society
IF3.8
err2025-10-15
err0
PREAI
errChang-Gi Lee; Won-Hyoung Lee; Boryung Yoo; Sungho Lee; Jae-Pyoung Ahn; Ayman A. El-Zoka; Se-Ho Kim
err分享
err收藏
Field-Induced Structural Dynamics of Polarization Switching in HfxZr1-xO2 Thin FilmsHfxZr1-xO2薄膜中极化反转的场致结构动力学
errAdvanced Materials
IF26.8
err2025-09-25
err0
PREAI
errSangjun Lee; Sunghyun Kim; Seong Yong Park; Donghyun Kim; Su Yong Lee; Daseul Ham; Hyun Hwi Lee; Dongjin Yun; Seontae Park; Soohwan Sul; Seungjin Kang; Geonu Kim; Duk-Hyun Choe; Jooho Lee; Beomseok Kim; Jinseong Heo; Hyung-Suk Jung; Hanjin Lim; Wonsik Choi; Jeong-Gyu Song
err分享
err收藏
Crack-Free Transfer of Wafer-Scale Freestanding Single-Crystalline Nanomembranes Enabled by Elastically Graded Polymer通过弹性梯度聚合物实现的晶圆级自由站立单晶纳米膜的免裂纹转移
errAdvanced Materials
IF26.8
err2025-09-12
err0
PREAI
errJi-Yun Moon; Sanggeun Bae; Jeehoon Ryu; Seung-Il Kim; Sangmoon Han; Justin S. Kim; Jonggyu Choi; Seungsoo Kim; Joo-Hong Lee; Seung-Gu Choi; Ting-Ran Liu; Soyeong Ahn; Jihyung Seo; Jun-Hui Choi; Hyung Jun Kwun; Yu-Tsun Shao; Hyeon-Don Kim; Jin-Hong Park; Jin-Wook Lee; Ji-Won Park; Jae-Hyun Lee; Jong-Hyun Ahn; Sang-Hoon Bae
err分享
err收藏
Middle Interlayer Engineered Ferroelectric NAND Flash Overcoming Reliability and Stability Bottlenecks for Next-Generation High-Density Storage Systems中间层工程化铁电NAND闪存：克服下一代高密度存储系统中的可靠性与稳定性瓶颈
errAdvanced Science
IF14.1
err2025-08-23
err0
errOAAI
errGiuk Kim; Sangho Lee; Hyojun Choi; Yangjin Jung; Woongjin Kim; Sanghyun Park; Kwangyou Seo; Kwangsoo Kim; Wanki Kim; Daewon Ha; Mincheol Shin; Jinho Ahn; Sanghun Jeon
err分享
err收藏
Initial Growth Mechanism and Microstructural Evolution of Sub-10 nm Hydrogenated Amorphous Silicon Films初始生长机制与亚10 nm氢化非晶硅薄膜的微观结构演化
errACS Applied Materials & Interfaces
IF0
err2025-08-19
err0
PREAI
errJin Young Lee; Jeong-Ho An; Seo Woo Sim; Do Hoe Kim; Yongrae Kim; Yun-Tak Han; Seung Min Park; Si Hyeong Lee; Ki Joon Seong; Soong Ju Oh; Junghan Lee; Hee-eun Song; Joon-Ho Oh; Ka-Hyun Kim
err分享
err收藏
Deriving optimal atomic layer deposition process conditions using machine learning使用机器学习导出最佳原子层沉积工艺条件
errJournal of Industrial Information Integration
IF11.6
err2025-05-28
err0
PREAI
errJangwon Seo; Hyo-Seok Hwang; Sunyoung Park; Seungmin Lee; Dae Sin Kim; Sun-Taek Lim; Junhee Seok
err分享
err收藏
Growth of Highly-Ordered-Crystalline Indium-Gallium-Oxide Thin-Film via Plasma-Enhanced ALD for High Performance Top-Gate Field-Effect Transistors通过等离子体增强ALD制备高度有序晶态铟镓氧化物薄膜，用于高性能顶栅场效应晶体管
errSMALL METHODS
IF9.1
err2024-12-30
err0
PREAI
errMin Jae Kim; Seon Woong Bang; Jae Seok Hur; Seong Hun Yoon; Cheol Hee Choi; Sang Won Chung; Jeong Eun Oh; Yena Kim; Bang Ju Park; Jeonga Lee; Hoichang Yang; Daewon Ha; Min Hee Cho; Jae Kyeong Jeong
err分享
err收藏
Identifying the Chemical Structure of Indium–Gallium–Zinc Oxide Thin Films with Oxygen Vacancy Variation识别不同氧空位含量的铟-镓-锌氧化物薄膜的化学结构
errACS Applied Electronic Materials
IF4.7
err
err0
PREAI
errJong-Cheol Lee; Jinheon Choi; Tackhwi Lee; Minsik Kim; Seongmin Ahn; Junghan Lee; Sungho Lee; Jihyun Kho; Yongsoon Choi; Kwangmin Park; Cheol Seong Hwang
err分享
err收藏