.png){kind=icon}
返回
Genetic algorithm-based optical proximity correction for DMD maskless lithography
.png){kind=icon}
OA
AI
DOI：10.1364/OE.493665.png)
.png){kind=icon}
原文求助.png){kind=icon}
分享.png){kind=icon}
收藏
摘要
En 中文
We present an optical proximity correction (OPC) method based on a genetic algorithm for reducing the optical proximity effect-induced pattern distortion in digital micromirror device (DMD) maskless lithography. Via this algorithm-assisted grayscale modulation of the initial mask at the pixel level, the exposure pattern can be enhanced significantly. Actual exposure experiments revealed that the rate of matching between the final exposure pattern and the mask pattern can be increased by up to 20%. This method's applicability to complex masks further demonstrates its universality for mask pattern optimization. We believe that our algorithm-assisted OPC could be highly helpful for high-fidelity and efficient DMD maskless lithography for microfabrication.
Keyword:
FABRICATION
OPTIMIZATION
ELEMENTS
期刊
IF:
3.3
论文数:
6.1W
被引数:
14.3W
机构
暂无机构信息
引用论文
User-defined microstructures array fabricated by DMD based multistep lithography with dose modulation.png)
OPTICS EXPRESSOAAI
OPTICS EXPRESSIF3.3
OAAI分享收藏λ/12 Super Resolution Achieved in Maskless Optical Projection Nanolithography for Efficient Cross-Scale PatterningNANO LETTERS
NANO LETTERSIF9.1
PREAI
分享收藏Rapid Fabrication of Complex 3D Extracellular Microenvironments by Dynamic Optical Projection StereolithographyADVANCED MATERIALSOAAI
ADVANCED MATERIALSIF26.8
OAAI分享收藏分享收藏Compensation of EUV lithography mask blank defect based on an advanced genetic algorithmOPTICS EXPRESSOAAI
OPTICS EXPRESSIF3.3
OAAI分享收藏Edge smoothness enhancement in DMD scanning lithography system based on a wobulation techniqueOPTICS EXPRESS
OAAI
OPTICS EXPRESSIF3.3
OAAI分享收藏分享收藏
查看更多内容