Imaging thick objects with deep-subangstrom resolution and deep-subpicometer precision

Wenfeng Yang

doi:10.1126/sciadv.aec9348

2026-06-03

DOI：10.1126/sciadv.aec9348

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摘要

En 中文

尺寸效应对材料的结构、力学和物理性质具有普遍影响，因此通过透射电子显微镜的高分辨率结构分析研究厚样品的本征性质具有重要意义。尽管多束电子层析成像技术已实现深亚埃级分辨率，但样品厚度通常非常有限。通过结合能量过滤和扩展局部轨道层析成像（eLOP，可在电子束扫描过程中提取变化的像差），本研究报告了厚度达85纳米的硅样品的层析成像重构结果，该厚度约为常规多束电子层析成像通常厚度阈值的三倍。像差变化的消除有助于实现信息极限为18皮米、原子位置精度为0.39皮米的高精度重构。对厚样品的精确层析成像重构能够促进固体中本征结构和物理现象的发现或解释，这对物理学、化学、材料科学和半导体器件工程具有重要意义。

期刊

Science Advances

IF:

12.5

论文数:

2.1W

被引数:

18.1W

机构

tsinghua university

学者数:

11.9W

论文数: 10.0W

被引数: 137

引用论文

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