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Nanoscale interface engineering for solid oxide fuel cells using atomic layer deposition

delete2022-01-01
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OA
AI
J
Jongsu Seo
S
Seung‐Hyun Kim
S
SungHyun Jeon
S
Suyeon Kim
J
Jeong Hwan Kim *
W
WooChul Jung *
DOI:10.1039/d1na00852hdelete
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摘要

摘要

En 中文
Atomic layer deposition (ALD), which is already actively used in the semiconductor industry, has been in the spotlight in various energy fields, such as batteries and fuel cells, given its unique ability to enable the nanoscale deposition of diverse materials with a variety of compositions onto complex 3D structures. In particular, with regard to ceramic fuel cells, ALD has attracted attention because it facilitates the manufacturing of thin and dense electrolytes. Furthermore, recently, electrode surfaces and electrode/electrolyte interface modification are arising as new research strategies to fabricate robust fuel cells. In this mini-review, we present a brief overview of ALD and recent studies that utilize ALD in ceramic fuel cells, such as manufacturing thin film electrolytes, stabilizing electrodes, functionalizing electrodes, and modifying the chemistry of electrode surfaces. We also propose research directions to expand the utility and functionality of the ALD techniques.
Keyword:
YTTRIA-STABILIZED ZIRCONIA
OXYGEN REDUCTION REACTION
SURFACE SR SEGREGATION
THIN-FILM
LOW-TEMPERATURE
PEROVSKITE OXIDES
HETEROGENEOUS CATALYSTS
ELECTRICAL DEFECTS
NEXT-GENERATION
SOFC CATHODES
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期刊

Nanoscale Advances 封面图
Nanoscale Advances
IF:
4.6
论文数:
877
被引数:
1.5W

机构

Hanbat National University 封面图
Hanbat National University
学者数:
2.1K
论文数: 2.2K
被引数: 1.9K
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