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One-dimensional angular-measurement-based stitching interferometry

delete2018-04-05
delete25
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OA
AI
L
Lei Huang *
J
Junpeng Xue
G
Ga, Bo
M
Mourad Idir
DOI:10.1364/OE.26.009882delete
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摘要

摘要

En 中文
In this work, we present. one-dimensional stitching interferometry based on the angular measurement for high-precision mirror metrology. The tilt error introduced by the stage motion during the stitching process is measured by an extra angular measurement device. The local profile measured by the interferometer in a single field of view is corrected using the measured angle before the piston adjustment in the stitching process. Comparing to the classical software stitching technique, the angle measuring stitching technique is more reliable and accurate in profiling mirror surface at the nanometer level. Experimental results demonstrate the feasibility of the proposed stitching technique. Based on our measurements, the typical repeatability within 200 mm scanning range is 0.5 nm RMS or less. (C) 2018 Optical Society of America
Keyword:
OPTICS
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Optics Express 封面图
Optics Express
IF:
3.3
论文数:
6.1W
被引数:
14.3W

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U
united states department of energy (doe)
学者数:
11.3W
论文数: 9.6W
被引数: 246
S
sichuan university
学者数:
12.1W
论文数: 7.8W
被引数: 100
B
Brookhaven National Laboratory
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6.4K
论文数: 4.9K
被引数: 1.9W
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