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Deriving optimal atomic layer deposition process conditions using machine learning
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DOI：10.1016/j.jii.2025.100879.png)
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Abstract
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• Introduced the ALD-GPR model combining MLP and GPR to predict partial pressure. • Achieved RMSE 0.0074 and 18x faster speed, proving ALD-GPR as a CFD alternative. • Developed metrics to assess uniformity and derive optimal ALD process conditions. • Provided a data-driven framework to enhance ALD process efficiency and uniformity.
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