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Deterministic doping

delete2017-05-01
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OA
AI
D
David N. Jamieson *
W
William I. L. Lawrie
S
Simon G. Robson
A
Alexander Jakob
B
Brett C. Johnson
J
Jeffrey C. McCallum
DOI:10.1016/j.mssp.2016.10.039delete
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Abstract

Abstract

En 中文
Emerging programs in a new field of technology that employs quantum mechanical principles in engineered devices has driven Pew approaches to atomic-scale fabrication. Of crucial importance is the capability to configure single atoms in silicon, diamond and other materials. These engineered materials form the foundations of quantum technology which includes the fields of quantum communication and quantum computing. Quantum technology exploits quantum superposition and entanglement in potentially scalable quantum devices. To insert donor atoms in a large-scale device methods for deterministic ion implantation have been developed. These methods potentially allow the standard techniques developed for engineering materials for the Information Technology industry to be employed to make devices that exploit the new technologies. This paper reviews the emerging new technologies for deterministic doping to address the challenges of engineering atoms in the solid state.
Keywords:
Ion implantation
Deterministic doping
Quantum computer technology
Dopant atoms
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Journal

Materials Science in Semiconductor Processing cover
Materials Science in Semiconductor Processing
IF:
4.6
Papers:
1.0W
Citations:
2.2W

Organization

U
university of melbourne
Scholars:
5.7W
Papers: 5.4W
Citations: 69