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Materials Science in Semiconductor Processing
IF
4.6
Papers
10161
Citations
21639
Related Insights
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Journal Papers
10047
Related Insights
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Journal Papers
10047
Publication Date
Publication Date
IF
Citations
Ferroelectric polymer mediated bipolar memristive switching in reduced graphene oxide nanocomposite device
Materials Science in Semiconductor Processing
IF
4.6
2026-10-06
0
PRE
AI
Nipom Sekhar Das; Himangshu Jyoti Gogoi; Tanmay Dutta
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Mechanistic study on the adsorption of Cr(III) and Cr(VI) by vacancy-defective MoTe
2
: A first-principles calculation
Materials Science in Semiconductor Processing
IF
4.6
2026-10-05
0
PRE
AI
Sujuan Wang; Xudong Man; Feifei Sun; Chi Liu; Yue Feng; Xin Liu; Tao Shen
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Terahertz nondestructive evaluation of heterogeneous packaging stackup: Multi-layer interposer
Materials Science in Semiconductor Processing
IF
4.6
2026-10-05
0
OA
AI
Haolian Shi; Christopher Blancher; Meghna Narayanan; Pragna Bhaskar; Erwan Emile; Mohanalingam Kathaperumal; Alexandre Locquet; D.S. Citrin
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Annealing-modulated ferroelectricity and leakage suppression in PLD-grown Gd-doped HfO
2
thin films with TiN top electrodes
Materials Science in Semiconductor Processing
IF
4.6
2026-10-05
0
PRE
AI
Yue-Sheng Wang; Ling-Mei Zhao; Ya-Nan Wang; Xiao-Jing Xu; Feng-Xian Jiang
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Removal of CeO
2
particles for SiO
2
/Si
3
N
4
post-CMP with composite cleaning solution: Performance and synergistic mechanism
Materials Science in Semiconductor Processing
IF
4.6
2026-10-05
0
PRE
AI
Wenyue Qi; Xinyu Han; Baimei Tan; Jiaji Geng; Fangyuan Wang; Xinyu Zhao; Jiadong Zhao
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Role of acidic and alkaline cleaning solutions on ceria removal and brush-mediated cross-contamination during post-STI CMP cleaning
Materials Science in Semiconductor Processing
IF
4.6
2026-10-05
0
PRE
AI
Sumit Kumar; Jae-Hyeong Lee; Yeon Je Gye; Tae-Gon Kim; Jihoon Seo; Jin-Goo Park
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Characteristics and mechanism of NF
3
plasma-modulated modification in atomic layer etching of silicon nitride
Materials Science in Semiconductor Processing
IF
4.6
2026-10-05
0
PRE
AI
Sung Hyun Lim; Jun Seo Hwang; So Won Kim; Hee Chul Lee
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Radiation-induced damage and static dielectric constant changes in AlGaN from multi-method simulations
Materials Science in Semiconductor Processing
IF
4.6
2026-10-05
0
PRE
AI
Xi Liang; Xiaoning Zhang; Mingxin Lv; Linhua Liu; Jia-Yue Yang
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Integrated experimental-numerical characterization of thickness and loading condition effects on mechanical properties in copper thin films
Materials Science in Semiconductor Processing
IF
4.6
2026-10-04
0
OA
AI
Dao Kun Lim; Derik Rudd; Kian Guan Khoo; Daijun Hu; Fa Xing Che; Venkata Rama Satya Pradeep Vempaty; Wen How Sim; Harjashan Veer Singh; Wentao Yan; Yeow Kheng Lim
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Enhanced resistive switching behavior in RF-sputtered Sm
2
Hf
2
O
7
thin films through controlled process conditions
Materials Science in Semiconductor Processing
IF
4.6
2026-10-03
0
PRE
AI
Ching-Tang Chen; Cheng-Liang Huang
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Fabrication of Ag
2
S/g-C
3
N
4
composite and its enhanced acousto-photocatalytic performance for methyl orange degradation
Materials Science in Semiconductor Processing
IF
4.6
2026-10-03
0
PRE
AI
Qingwang Liu; Zihan Wang; Wanmeng Gao; Yujie Fan; Guozhi Liang; Xiangjun Ren; Mai Xu
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Coupled mechanical and chemical effects of slurry temperature in DETA-assisted silicon chemical mechanical planarization
Materials Science in Semiconductor Processing
IF
4.6
2026-10-03
0
PRE
AI
Daehoon Kang; Jongyeong Jeon; Hyeonjeong Lee; Jeewoon Choi; Hyunkyu Kim; Yechan Kim; Wookyung Jeon; Taesung Kim
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Interfacial behavior and evolution mechanisms of mechanical and thermal properties in graphene/Cu composites based on molecular dynamics and spark plasma sintering
Materials Science in Semiconductor Processing
IF
4.6
2026-10-03
0
PRE
AI
Haojie Jiang; Jiabao Pan; Hongzhao Li; Hongsheng Jia; Zeao Liu; Yuanqing Zhang; Minghe Chen; Yang Chen
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SiCl
4
-based reactive ion etching for controlled low-damage mesa and gate recess formation in β-Ga
2
O
3
MOSFETs
Materials Science in Semiconductor Processing
IF
4.6
2026-10-03
0
PRE
AI
Sai GuruKrishna Vadlamudi; Dagmar Gregušová; Kristína Hušeková; Shima Sousani; Alica Rosová; Tibor Izsák; Hemendra Chouhan; Zuzana Pospechová; Ondrej Pohorelec; Milan Ťapajna; Filip Gucmann
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Defect–regulated Yb–doped WO
3
nanoparticles for enhanced H
2
S sensing
Materials Science in Semiconductor Processing
IF
4.6
2026-10-03
0
PRE
AI
Zihan Li; Jiahao Niu; Bo Zhang
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Assessing the electrical properties of cubic silicon carbide by mercury probe measurements
Materials Science in Semiconductor Processing
IF
4.6
2026-10-03
0
OA
AI
Kushani H. Perera; Gerard Colston; Andrew Graham; Arne Renz; Peter M. Gammon; Marina Antoniou; Vishal A. Shah
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Physics-guided Gaussian process framework for data-efficient optimization of APCVD growth of 2D semiconductor WS
2
Materials Science in Semiconductor Processing
IF
4.6
2026-10-03
0
PRE
AI
Ayub Sekh; Vijay K. Singh
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A dimensionless nanoindentation-based inverse framework for identifying Johnson–Cook constitutive parameters in Sn-based solder materials
Materials Science in Semiconductor Processing
IF
4.6
2026-10-02
0
PRE
AI
Ziyi Shen; Kim Shyong Siow; Shaoxi Wang; Xu Long
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Hardware-intrinsic secure optical communication via bias-gated bipolarity in a MoS
2
/
α
-Ga
2
O
3
heterostructure
Materials Science in Semiconductor Processing
IF
4.6
2026-10-02
0
PRE
AI
Yunxiang Weng; Gang Wu; Jiangmei Fang; Shuo Jin; Yiming Zhao; Kai Chen; Daoyou Guo
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The impact of
dielectric layers deposited at different temperatures on performance and reliability of hydrogen-terminated single-crystal diamond MOSFETs
Materials Science in Semiconductor Processing
IF
4.6
2026-10-02
0
PRE
AI
Chunlei Li; Lingxue Meng; Xu Ma; Hangyu Yue; Xiang Chen; Jiali Zhou; Linhai Guo; Yimin Wan; Li Tian; Xiaoying Zheng
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