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Study on silicon dioxide chemical mechanical planarization using iron-cobalt double-doped cerium dioxide abrasives

delete2026-05-15
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PRE
AI
Y
Yu, Bibo
W
Wang, Shengli
C
Chong Luo *
H
Hu, Xilian
Z
Zhang, Lihong
DOI：10.1088/1402-4896/ae64b3delete
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Abstract

Abstract

En 中文
In this paper, iron-cobalt double-doped CeO2 (CeO2-FeCo) abrasives was synthesized by hydrothermal method with a particle size of about 50 nm. It was found that iron-cobalt double-doping could effectively regulate the lattice structure and Ce3+/Ce4+ of CeO2 ratio by Raman, UV-vis, XPS experiments. CMP experiments show that CeO2-FeCo has the optimal polishing effect, with a removal rate of 365.1 nm min(-1) and a low surface roughness as low as 0.148 nm, which is mainly attributed to the improvement of the Ce3+ content (25.7% to 32.65%) on the surface roughness improvement.
Keywords:
chemical mechanical planarization
CeO2
double-doped
SiO2 CMP

Journal

Physica Scripta cover
Physica Scripta
IF:
2.6
Papers:
4.3K
Citations:
2.5W

Organization

H
Hebei University of Technology
Scholars:
2.6K
Papers: 762
Citations: 1.7W
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