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Journal of Micro-Nanopatterning Materials and Metrology-JM3

IF1.8
Papers9
Citations
Journal Papers 9
Publication Date
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Enhanced multipopulation GA-BBO with chaotic acceleration for digital lithography mask optimization
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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deleteHuang, Shengzhou; Pan, Jiani; Wu, Dongjie; Shao, Yongkang; He, Siwen
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Euler-Bernoulli bending theory applied to high NA EUV dense line-space patterning to characterize the line wiggling
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IF1.8
delete2026-01-01
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deleteDe Simone, Danilo; Lorusso, Gian F.
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Optimizing experimental design for fast and accurate CD metrology of interconnects using coherent extreme-ultraviolet scatterometry
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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deleteKlein, Clay; Jenkins, Nicholas W.; Shao, Yunzhe; Li, Yunhao; Shin, Junho; Park, Seungbeom; Kim, Wookrae; Kapteyn, Henry C.; Murnane, Margaret M.
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Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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deletePollentier, Ivan; Holzmeier, Fabian; Fallica, Roberto; Chen, Ying-Lin; Singh, Dhirendra P.; Piatti, Lorenzo; Suh, Hyo Seon; De Simone, Danilo; De Gendt, Stefan; Van Der Heide, Paul; Petersen, John; Dorney, Kevin
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Constitutive diffusion model for precise critical dimension patterning via beam shape optimization and effects on uniformity
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IF1.8
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deleteAlrashdan, Abdullah; Zohdi, Tarek
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Focus enhancement for image-based overlay metrology targets via generative models
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IF1.8
delete2026-01-01
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deleteHyun, Minsung; Kwak, Nojun
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In-line metrology and inspection for hidden structure of lateral gate-all-around devices enabled by high voltage critical dimension scanning electron microscopy
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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deleteShohjoh, Tomoyasu; Isawa, Miki; Lorusso, Gian Francesco; Horiguchi, Naoto; Mertens, Hans; Bogdanowicz, Janusz; De Bisschop, Peter; Charley, Anne-Laure
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X-ray metrology for advanced semiconductor manufacturing of next-generation logic devices
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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deletePandey, Gaurav; Fu, Wei-En; Liu, Chun-Yu; Ho, Chao-Ching; Chen, Liang-Chia
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EUV Lithography: There is Still Much to Do
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
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deleteLevinson, Harry J.
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