Normally-Off Top-Gate Self-Aligned Field-Effect Transistor Including Crystal InOx Formed by Hydrogen Gas-Free Sputtering With Channel Length of 3 μm and High Field-Effect Mobility Over 75 cm2/Vs Fabricated through 400°C Process
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Cai, Minghan; Li, Zhenzhen; Li, Guomeng; Xia, Zengqiang; Zu, Zhao; Li, Hui; Zhao, Wenyan; Zhang, Haohan; Qu, Cheng; Zhang, Yuewei; Zhang, Dongdong; Ha, Mihwa; Song, Wonjun; Huang, Genmao; Duan, Lian; Shen, Ying; Lee, C. c.; Zhang, Deqiang
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Save 8.3-in. 1058 ppi Crystal Indium Oxide Display With Side-by-Side Method Using Fine Metal Mask and Partition Wall Dividing OLED in Subpixels
Eguchi, Shingo; Aoyama, Tomoya; Kato, Sho; Oide, Takayuki; Inoue, Seiko; Yamagata, Sachiko; Kubota, Daisuke; Kusunoki, Koji; Idojiri, Satoru; Nakazawa, Yasutaka; Sato, Rai; Yamazaki, Shunpei
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Save Liquid Crystal Beam Control Technology
Wang, Feifei; Liang, Yue; Liu, Ziqi; Feng, Liping; Ma, Xinli; Jiang, Ni; Zhang, Ruichen; Wang, Kaixuan; Zuo, Xiongcan; Chen, Xi; Feng, Bin; Shao, Xibin
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