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SaveAtomistic mechanisms of SiC electrochemical mechanical polishing in aqueous H2O2: A ReaxFF molecular dynamics study
Zhu, Rui; Zhang, Tianyu; Yao, Qingyu; Peng, Yang; Cheng, Feng; Wang, Zirui; Wang, Yongguang; Lu, Xiaolong; Wang, Chuanyang; Zhao, Yongwu
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