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Nonchemically-Amplified Molecular Resists Based on Calixarene Derivatives Enabling 14 nm Half-Pitch Nanolithography Peng, Rongrong; Chen, Jinping; Yu, Tianjun; Zeng, Yi; Wang, Shuangqing; Guo, Xudong; Hu, Rui; Tian, Peng; Vockenhuber, Michaela; Kazazis, Dimitrios; Zhao, Jun; Wu, Yanqin; Ekinci, Yasin; Yang, Guoqiang; Li, Yi Share Save
Performance Optimization of Sulfonium-Functionalized Molecular Resists for EUV and Electron Beam Lithography Liu, Zhuoran; Chen, Jinping; Yu, Tianjun; Zeng, Yi; Guo, Xudong; Wang, Shuangqing; Hu, Rui; Vockenhuber, Michaela; Tian, Peng; Kazazis, Dimitrios; Ekinci, Yasin; Yang, Guoqiang; Li, Yi Share Save
Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da) Saifullah, Mohammad S. M.; Rajak, Anil Kumar; Hofhuis, Kevin A.; Tiwale, Nikhil; Mahfoud, Zackaria; Testino, Andrea; Karadan, Prajith; Vockenhuber, Michaela; Kazazis, Dimitrios; Valiyaveettil, Suresh; Ekinci, Yasin Share Save
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Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions Evrard, Quentin; Sadegh, Najmeh; Mathew, Simon; Zuidinga, Ed; Watts, Benjamin; Dominguez, Maximilian Paradiz; Giglia, Angelo; Mahne, Nicola; Nannarone, Stefano; Nishimura, Akira; Goya, Tsuyoshi; Sugioka, Takuo; Vockenhuber, Michaela; Ekinci, Yasin; Brouwer, Albert M. Share Save
Optimization strategy for epoxy cross-linked molecular glass photoresist in EUV lithography Gao, Jiaxing; Zhang, Siliang; Cui, Xuewen; Cong, Xue; Guo, Xudong; Hu, Rui; Wang, Shuangqing; Chen, Jinping; Li, Yi; Tian, Peng; Vockenhuber, Michaela; Kazazis, Dimitrios; Ekinci, Yasin; Yang, Guoqiang Share Save
EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning Constantinou, Procopios; Stock, Taylor J. Z.; Tseng, Li-Ting; Kazazis, Dimitrios; Muntwiler, Matthias; Vaz, Carlos A. F.; Ekinci, Yasin; Aeppli, Gabriel; Curson, Neil J.; Schofield, Steven R. Share Save
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Charge Shielding-Oriented Design of Zinc-Based Nanoparticle Liquids for Controlled Nanofabrication Tao, Peipei; Wang, Qianqian; Vockenhuber, Michaela; Zhu, Da; Liu, Tianqi; Wang, Xiaolin; Hu, Ziyu; Wang, Yimeng; Wang, Jianlong; Tang, Yaping; Ekinci, Yasin; Xu, Hong; He, Xiangming Share Save
Resistless EUV lithography: Photon-induced oxide patterning on silicon Tseng, Li -Ting; Karadan, Prajith; Kazazis, Dimitrios; Constantinou, Procopios C.; Stock, Taylor J. Z.; Curson, Neil J.; Schofield, Steven R.; Muntwiler, Matthias; Aeppli, Gabriel; Ekinci, Yasin Share Save
Sulfonium-Functionalized Polystyrene-Based Nonchemically Amplified Resists Enabling Sub-13 nm Nanolithography Wang, Zhihao; Chen, Jinping; Yu, Tianjun; Zeng, Yi; Guo, Xudong; Wang, Shuangqing; Allenet, Timothee; Vockenhuber, Michaela; Ekinci, Yasin; Yang, Guoqiang; Li, Yi Share Save
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Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography Wang, Yake; Chen, Jinping; Zeng, Yi; Yu, Tianjun; Guo, Xudong; Wang, Shuangqing; Allenet, Timothee; Vockenhuber, Michaela; Ekinci, Yasin; Zhao, Jun; Yang, Shumin; Wu, Yanqing; Yang, Guoqiang; Li, Yi Share Save
Charge Configuration Memory Devices: Energy Efficiency and Switching Speed Mraz, Anze; Venturini, Rok; Svetin, Damjan; Sever, Vitomir; Mihailovic, Ian Aleksander; Vaskivskyi, Igor; Ambrozic, Bojan; Drazic, Goran; D'Antuono, Maria; Stornaiuolo, Daniela; Tafuri, Francesco; Kazazis, Dimitrios; Ravnik, Jan; Ekinci, Yasin; Mihailovic, Dragan Share Save
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