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Van der Waals devices for surface-sensitive experiments
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DOI：10.1039/D5NR02125A.png)
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Abstract
En 中文
In-operando characterization of van der Waals (vdW) devices using surface-sensitive methods provides critical insights into phase transitions and correlated electronic states. Yet; integrating vdW materials in functional devices while maintaining pristine surfaces is a key challenge for combined transport and surface-sensitive experiments. Conventional lithographic techniques introduce surface contamination; limiting the applicability of state-of-the-art spectroscopic probes. We present a stencil lithography-based approach for fabricating vdW devices; producing micron-scale electrical contacts; and exfoliation in ultra-high vacuum. The resist-free patterning method utilizes a shadow mask to define electrical contacts and yields thin flakes down to the single-layer regime via gold-assisted exfoliation. As a demonstration; we fabricate devices from 1T–TaS2 flakes; achieving reliable contacts for application of electrical pulses and resistance measurements; as well as clean surfaces allowing for angle-resolved photoemission spectroscopy. The approach provides a platform for studying the electronic properties of vdW systems with surface-sensitive probes in well-defined device geometries.
Keywords:
van der Waals devices
stencil lithography
surface-sensitive characterization
angle-resolved photoemission spectroscopy
1T–TaS2