Kenta Arima - Publications, H-index & Citations

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Kenta Arima

osaka university

30H-index

244Paper Count

2.6KCitation Count

Published Papers 36

Publication Date

Measurement of electrical characteristics of Ge-based diodes with thermal GeO2 films exposed to controlled humidity conditions

JOURNAL OF APPLIED PHYSICS

IF2.5

2025-04-16

OAAI

Sano, Shuto; Takano, Hiroki; Wada, Yohei; Crumlin, Ethan J.; Inagaki, Kouji; Arima, Kenta

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First-principles simulations of scanning tunneling microscopy images exhibiting anomalous dot patterns on armchair-edged graphene nanoribbons

PHYSICAL REVIEW RESEARCH

IF4.2

2024-03-07

OAAI

Li, Junhuan; Inagaki, Kouji; Arima, Kenta

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Highly efficient finishing of large-sized single crystal diamond substrates by combining nanosecond pulsed laser trimming and plasma-assisted polishing

CERAMICS INTERNATIONAL

IF5.6

2023-06-01

OAAI

Liu, Nian; Sugimoto, Kentaro; Yoshitaka, Naoya; Yamada, Hideaki; Sun, Rongyan; Arima, Kenta; Yamamura, Kazuya

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Separation of Neighboring Terraces on a Flattened Si(111) Surface by Selective Etching along Step Edges Using Total Wet Chemical Processing

LANGMUIR

IF3.9

2022-03-17

PREAI

Ma, Zhida; Masumoto, Seiya; Kawai, Kentaro; Yamamura, Kazuya; Arima, Kenta

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Efficient and slurryless ultrasonic vibration assisted electrochemical mechanical polishing for 4H-SiC wafers

CERAMICS INTERNATIONAL

IF5.6

2022-03-01

OAAI

Yang, Xiaozhe; Yang, Xu; Gu, Haiyang; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya

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Charge Utilization Efficiency and Side Reactions in the Electrochemical Mechanical Polishing of 4H-SiC (0001)

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2022-02-01

PREAI

Yang, Xiaozhe; Yang, Xu; Gu, Haiyang; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya

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Novel highly-efficient and dress-free polishing technique with plasma-assisted surface modification and dressing

PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY

IF3.7

2021-11-01

OAAI

Sun, Rongyan; Nozoe, Atsunori; Nagahashi, Junji; Arima, Kenta; Kawai, Kentaro; Yamamura, Kazuya

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Novel SiC wafer manufacturing process employing three-step slurryless electrochemical mechanical polishing

JOURNAL OF MANUFACTURING PROCESSES

IF6.8

2021-10-01

PREAI

Yang, Xu; Yang, Xiaozhe; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya

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Dominant factors and their action mechanisms on material removal rate in electrochemical mechanical polishing of 4H-SiC (0001) surface

APPLIED SURFACE SCIENCE

IF6.9

2021-10-01

OAAI

Yang, Xiaozhe; Yang, Xu; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya

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Atomic-scale insights into the origin of rectangular lattice in nanographene probed by scanning tunneling microscopy

PHYSICAL REVIEW B

IF3.7

2021-06-24

OAAI

Li, Junhuan; Li, Shaoxian; Higashi, Tomoki; Kawai, Kentaro; Inagaki, Kouji; Yamamura, Kazuya; Arima, Kenta

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Damage-free highly efficient plasma-assisted polishing of a 20-mm square large mosaic single crystal diamond substrate

SCIENTIFIC REPORTS

IF3.9

2020-11-10

OAAI

Liu, Nian; Sugawara, Kohki; Yoshitaka, Naoya; Yamada, Hideaki; Takeuchi, Daisuke; Akabane, Yuko; Fujino, Kenichi; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya

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Catalytic Properties of Chemically Modified Graphene Sheets to Enhance Etching of Ge Surface in Water

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2020-02-28

PREAI

Mikurino, Ryo; Ogasawara, Ayumi; Hirano, Tomoki; Nakata, Yuki; Yamashita, Hiroto; Li, Shaoxian; Kawai, Kentaro; Yamamura, Kazuya; Arima, Kenta

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High-quality plasma-assisted polishing of aluminum nitride ceramic

CIRP ANNALS-MANUFACTURING TECHNOLOGY

IF3.6

2020-01-01

OAAI

Sun, Rongyan; Yang, Xu; Arima, Kenta; Kawai, Kentaro; Yamamura, Kazuya

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Highly efficient planarization of sliced 4H-SiC (0001) wafer by slurryless electrochemical mechanical polishing

INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE

IF18.8

2019-09-01

PREAI

Yang, Xu; Yang, Xiaozhe; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya

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Surface Modification and Microstructuring of 4H-SiC(0001) by Anodic Oxidation with Sodium Chloride Aqueous Solution

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2018-12-24

PREAI

Yang, Xu; Sun, Rongyan; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya

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Investigation of reaction sequence occurring in graphene-assisted chemical etching of Ge surfaces in water

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

IF4.6

2018-11-01

PREAI

Li, Shaoxian; Nakade, Kazuki; Hirano, Tomoki; Kawai, Kentaro; Arima, Kenta

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Investigation of anodic oxidation mechanism of 4H-SiC (0001) for electrochemical mechanical polishing

ELECTROCHIMICA ACTA

IF5.6

2018-05-01

PREAI

Yang, Xu; Sun, Rongyan; Ohkubo, Yuji; Kawai, Kentaro; Arima, Kenta; Endo, Katsuyoshi; Yamamura, Kazuya

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Anomalous Hall conductivity and electronic structures of Si-substituted Mn2CoAl epitaxial films

PHYSICAL REVIEW B

IF3.7

2018-02-26

OAAI

Arima, K.; Kuroda, F.; Yamada, S.; Fukushima, T.; Oguchi, T.; Hamaya, K.

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Chemical etching of a semiconductor surface assisted by single sheets of reduced graphene oxide

CARBON

IF11.6

2018-02-01

PREAI

Hirano, Tomoki; Nakade, Kazuki; Li, Shaoxian; Kawai, Kentaro; Arima, Kenta

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Catalyst-referred etching of silicon

SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS

IF6.9

2016-01-12

OAAI

Hara, Hideyuki; Sano, Yasuhisa; Arima, Kenta; Yagi, Keita; Murata, Junji; Kubota, Akihisa; Mimura, Hidekazu; Yamauchi, Kazuto

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Research Directions